Invention Grant
- Patent Title: Heterostructure and method of fabrication
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Application No.: US17075465Application Date: 2020-10-20
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Publication No.: US11637542B2Publication Date: 2023-04-25
- Inventor: Arnaud Castex , Daniel Delprat , Bernard Aspar , Ionut Radu
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1501222 20150612
- Main IPC: H03H9/02
- IPC: H03H9/02 ; H01L41/08 ; H03H3/04 ; H03H9/64 ; H01L41/312 ; H01L41/313 ; H01L41/187 ; H03H3/10 ; H01L41/47 ; H01L41/332 ; H01L41/337

Abstract:
The present invention relates to a heterostructure, in particular, a piezoelectric structure, comprising a cover layer, in particular, a layer of piezoelectric material, the material of the cover layer having a first coefficient of thermal expansion, assembled to a support substrate, the support substrate having a second coefficient of thermal expansion substantially different from the first coefficient of thermal expansion, at an interface wherein the cover layer comprises at least a recess extending from the interface into the cover layer, and its method of fabrication.
Public/Granted literature
- US20210058058A1 HETEROSTRUCTURE AND METHOD OF FABRICATION Public/Granted day:2021-02-25
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