Invention Grant
- Patent Title: Lithography thermal control
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Application No.: US17462563Application Date: 2021-08-31
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Publication No.: US11647578B2Publication Date: 2023-05-09
- Inventor: Tai-Yu Chen , Cho-Ying Lin , Sagar Deepak Khivsara , Hsiang Chen , Chieh Hsieh , Sheng-Kang Yu , Shang-Chieh Chien , Kai Tak Lam , Li-Jui Chen , Heng-Hsin Liu , Zhiqiang Wu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20

Abstract:
A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
Public/Granted literature
- US20230065403A1 LITHOGRAPHY THERMAL CONTROL Public/Granted day:2023-03-02
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