Plasma erosion resistant rare-earth oxide based thin film coatings
Abstract:
A chamber component for a process chamber comprises a ceramic body and one or more protective layer on at least one surface of the ceramic body, wherein the one or more protective layer comprises Y3Al5O12 having a dielectric constant of 9.76+/−up to 30% and a hermiticity of 4.4E-10 cm3/s+/−up to 30%.
Public/Granted literature
Information query
Patent Agency Ranking
0/0