Invention Grant
- Patent Title: Method and composition for selectively modifying base material surface
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Application No.: US17148729Application Date: 2021-01-14
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Publication No.: US11705331B2Publication Date: 2023-07-18
- Inventor: Hiroyuki Komatsu , Tomohiro Oda , Hitoshi Osaki , Masafumi Hori , Takehiko Naruoka
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 16171340 2016.09.01
- The original application number of the division: US16288354 2019.02.28
- Main IPC: H01L21/027
- IPC: H01L21/027 ; C08F112/08 ; C09D125/06 ; H01L21/28 ; H01L21/321 ; H01L21/285 ; C08F8/00 ; H01L21/02 ; H01L21/311 ; C08F120/14 ; C08L25/06 ; C08L33/10
Abstract:
A composition for use in selective modification of a base material surface includes a polymer having, at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with a metal, and a solvent.
Public/Granted literature
- US20210166935A1 METHOD AND COMPOSITION FOR SELECTIVELY MODIFYING BASE MATERIAL SURFACE Public/Granted day:2021-06-03
Information query
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