- 专利标题: Magnetic memory device and method for fabricating the same
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申请号: US17202648申请日: 2021-03-16
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公开(公告)号: US11735241B2公开(公告)日: 2023-08-22
- 发明人: Hee Ju Shin , Sang Hwan Park , Se Chung Oh , Ki Woong Kim , Hyeon Woo Seo
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR 20200086510 2020.07.14
- 主分类号: G11C11/00
- IPC分类号: G11C11/00 ; G11C11/16 ; H01F10/32 ; H10N50/01 ; H10N50/10 ; H10N50/80 ; H10N50/85
摘要:
A magnetic memory device includes a pinned layer, a free layer, a tunnel barrier layer between the pinned layer and the free layer, a first oxide layer spaced apart from the tunnel barrier layer with the free layer therebetween, and a second oxide layer spaced apart from the free layer with the first oxide layer therebetween. The first oxide layer includes an oxide of a first material and may have a thickness of 0.3 Å to 2.0 Å. The second oxide layer may include an oxide of a second material and may have a thickness of 0.1 Å to 5.0 Å. A first oxygen affinity of the first material may be greater than a second oxygen affinity of the second material.
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