Invention Grant
- Patent Title: Fluid discharging device, substrate processing system including same, and fluid discharging method thereof
-
Application No.: US17073338Application Date: 2020-10-17
-
Publication No.: US11752530B2Publication Date: 2023-09-12
- Inventor: Woo Sin Jung , Sang Eun Noh , Dae Sung Kim
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Priority: KR 20190130046 2019.10.18
- Main IPC: B08B3/14
- IPC: B08B3/14 ; B08B3/12 ; B08B13/00 ; H01L21/02
Abstract:
A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.
Public/Granted literature
Information query
IPC分类:
