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公开(公告)号:US12124169B2
公开(公告)日:2024-10-22
申请号:US17566395
申请日:2021-12-30
Applicant: SEMES CO., LTD.
Inventor: Sang Eun Noh , Ki Sang Eum , Chang Suk Oh
Abstract: Provided is an apparatus for treating a substrate. In the exemplary embodiment, the apparatus for treating the substrate includes a cup configured to have a treating space with an opened upper portion; a support unit configured to support the substrate in the treating space; a liquid supply unit configured to have a treating liquid supply nozzle for supplying a treating liquid to the substrate supported by the support unit; and a nozzle standby port which is positioned outside treating space, provides a standby space in which the nozzle stands by before and after treating the substrate in the treating space, and has a cleaning member for cleaning the nozzle positioned in the standby space, wherein the nozzle standby port includes an insertion hole provided so that a nozzle tip of the treating liquid supply nozzle is insertable; and a spray member configured to spray a cleaning liquid to the nozzle tip inserted into the insertion hole, wherein an impact point of the cleaning liquid may be spaced apart from the center of the nozzle tip at a predetermined distance.
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公开(公告)号:US12055866B2
公开(公告)日:2024-08-06
申请号:US17465293
申请日:2021-09-02
Applicant: SEMES CO., LTD.
Inventor: Kisang Eum , Chang Suk Oh , Sang Eun Noh
CPC classification number: G03F7/70925 , B08B9/0936 , B08B13/00 , B08B2209/08
Abstract: The inventive concept relates to a substrate treating apparatus, and may include a substrate treating apparatus includes a rotatable spin head, a cup that surrounds the spin head, a cleaning jig seated on the spin head, and that discharges a cleaning liquid toward the cup through rotation of the spin head, and a nozzle unit located at an upper portion of the cleaning jig and that supplies the cleaning liquid to a center of an upper surface of the cleaning jig, and the cleaning jig includes spattering guide grooves formed to be recessed such that the cleaning liquid provided from the nozzle unit spatters toward the cup with a centrifugal force due to the rotation of the spin head.
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公开(公告)号:US11752530B2
公开(公告)日:2023-09-12
申请号:US17073338
申请日:2020-10-17
Applicant: SEMES CO., LTD.
Inventor: Woo Sin Jung , Sang Eun Noh , Dae Sung Kim
CPC classification number: B08B3/14 , B08B3/12 , B08B13/00 , H01L21/02057
Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.
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