SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR MANAGING PHOTORESIST

    公开(公告)号:US20230176482A1

    公开(公告)日:2023-06-08

    申请号:US18060629

    申请日:2022-12-01

    CPC classification number: G03F7/16 B05C11/1026 B05C11/1013 B05C11/1036

    Abstract: Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.

    PUMP, APPARATUS FOR SUPPLYING CHEMICAL LIQUID AND APPARATUS FOR PROCESSING SUBSTRATE

    公开(公告)号:US20230313791A1

    公开(公告)日:2023-10-05

    申请号:US18105878

    申请日:2023-02-05

    CPC classification number: F04B43/10 F04B43/0072 B05B9/0406

    Abstract: Provided are a pump, an apparatus for supplying a chemical liquid and an apparatus for processing a substrate. The pump includes a tube having elasticity and having a flow path through which a chemical liquid flows in; and a case having an internal space partitioned into at least two chambers through which gas is supplied or discharged, where the at least two chambers cover an outer circumference of the tube. Using the pump, the apparatus for supplying a chemical liquid and the apparatus for processing a substrate, by an operation in which gas is supplied or discharged into each partitioned chamber in the case, by applying or releasing pressure to the outer circumference of each corresponding tube independently without interfering between the internal pressures between the chambers, efficient pumping operation of the pump may be obtained, and precise control of the discharge pressure of the liquid may be implemented.

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