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1.发明授权公开(公告)号：US12119241B2
公开(公告)日：2024-10-15
申请号：US17879012
申请日：2022-08-02
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa Lee , Dai Geon Yoon , Soo Hong Lee , Ji Hyeon Kim , Dae Sung Kim
CPC classification number: H01L21/67051 , B41J2/16517 , H01L21/67253
Abstract: A unit for supplying a substrate-treating liquid is provided with a first reservoir and a second reservoir between which a differential pressure is constantly maintained to establish a flow rate, along with a substrate-treating apparatus having the unit for supplying the substrate-treating liquid. The unit for supplying the substrate-treating liquid includes a supply reservoir module and a buffer reservoir module. The supply reservoir module includes a first reservoir for supplying the substrate-treating liquid to an inkjet head unit for jetting the substrate-treating liquid onto a substrate, and a second reservoir for recovering the substrate-treating liquid that remains unused in the inkjet head unit. The buffer reservoir module is configured to provide the substrate-treating liquid to the first reservoir. Differential pressure is constantly maintained between the first reservoir and the second reservoir.
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公开(公告)号：US20240217243A1
公开(公告)日：2024-07-04
申请号：US18302323
申请日：2023-04-18
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa LEE , Dai Geon Yoon , Soo Hong Lee , Bong Man Choi , Dae Sung Kim
IPC: B41J2/175 , B41J29/393
CPC classification number: B41J2/17596 , B41J29/393
Abstract: An ink treatment apparatus and method are provided. The ink treatment apparatus includes: a reservoir storing ink; a head module ejecting the ink; a first control valve controlling a flow of the ink; a plurality of fluid transfer lines installed between the reservoir and the head module and having the ink flow therein; a pump installed in the fluid transfer lines to pump the ink; a flow rate measurement module installed in the fluid transfer line, the flow rate measurement module measuring a flow rate of the ink in accordance with the flow of the ink and providing ink flow rate information that is information regarding the flow rate of the ink; and a control module controlling a circulation ratio of the ink between the fluid transfer lines by controlling the pump and the first control valve based on the ink flow rate information.
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公开(公告)号：US11673075B2
公开(公告)日：2023-06-13
申请号：US17468800
申请日：2021-09-08
Applicant: SEMES CO., LTD.
Inventor： Dae Sung Kim
CPC classification number: B01D19/0094 , G03F7/70858
Abstract: Disclosed is a degassing apparatus. The degassing apparatus includes a dissolved gas extracting nozzle that extracts dissolved gases in a form of bubbles from a treatment solution including the dissolved gases, a first tank that separates the bubbles extracted while passing through the dissolved gas extracting nozzle from the treatment solution, and a second tank having a stabilization space, in which the treatment solution, from which the bubbles have been separated, is stored from the first tank and is stabilized. The dissolved gas extracting nozzle is configured such that a diameter of an outlet is smaller than a diameter of an intermediate passage such that the dissolved gases in the treatment solution are extracted in the form of the bubbles through a cavitation phenomenon.
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公开(公告)号：US12090754B2
公开(公告)日：2024-09-17
申请号：US17870835
申请日：2022-07-22
Applicant: SEMES CO., LTD.
Inventor： Sang Uk Son , Yong Tak Hyun , Dae Sung Kim
IPC: B41J2/045
CPC classification number: B41J2/0451 , B41J2/04586
Abstract: Provided are a nozzle inspection method and a nozzle inspection apparatus capable of accurately detecting a defect in an inkjet head nozzle within a short time. The nozzle inspection method comprises discharging a plurality of droplets into a first region of interest of a substrate using a first nozzle to form an inspection pattern, and determining whether the first nozzle is defective based on the inspection pattern.
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公开(公告)号：US20230176482A1
公开(公告)日：2023-06-08
申请号：US18060629
申请日：2022-12-01
Applicant: SEMES CO., LTD.
Inventor： Hae Kyung KIM , Dae Sung Kim , Woo Sin Jung
CPC classification number: G03F7/16 , B05C11/1026 , B05C11/1013 , B05C11/1036
Abstract: Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20230068426A1
公开(公告)日：2023-03-02
申请号：US17879012
申请日：2022-08-02
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa LEE , Dai Geon Yoon , Soo Hong Lee , Ji Hyeon Kim , Dae Sung Kim
Abstract: A unit for supplying a substrate-treating liquid is provided with a first reservoir and a second reservoir between which a differential pressure is constantly maintained to establish a flow rate, along with a substrate-treating apparatus having the unit for supplying the substrate-treating liquid. The unit for supplying the substrate-treating liquid includes a supply reservoir module and a buffer reservoir module. The supply reservoir module includes a first reservoir for supplying the substrate-treating liquid to an inkjet head unit for jetting the substrate-treating liquid onto a substrate, and a second reservoir for recovering the substrate-treating liquid that remains unused in the inkjet head unit. The buffer reservoir module is configured to provide the substrate-treating liquid to the first reservoir. Differential pressure is constantly maintained between the first reservoir and the second reservoir.
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公开(公告)号：US11121007B2
公开(公告)日：2021-09-14
申请号：US16532986
申请日：2019-08-06
Applicant: Semes Co., Ltd.
Inventor： Jae-Youl Kim , Jeeyong Jung , Young Ho Seo , Dae Sung Kim , Beomjeong Oh , Kwangbok Jun , Hyungoo Kwon , Sanguk Son
Abstract: An apparatus for supplying chemical liquid may include a chemical liquid discharging member, a reservoir, a chemical liquid supplying member and a chemical liquid circulating member. The chemical liquid discharging member may discharge a chemical liquid onto a substrate. The reservoir may store the chemical liquid supplied to the chemical liquid discharging member. The chemical liquid supplying member may supply the chemical liquid stored in the reservoir. The chemical liquid circulating member may circulate the chemical liquid from the chemical liquid discharging member to the reservoir.
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8.发明授权公开(公告)号：US12269273B2
公开(公告)日：2025-04-08
申请号：US17851029
申请日：2022-06-28
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa Lee , Dai Geon Yoon , Soo Hong Lee , Ji Hyeon Kim , Dae Sung Kim
IPC: B41J2/175
Abstract: Provided are a substrate treating liquid supply unit for constantly maintaining a liquid level of a nozzle of an inkjet head unit through real-time water level measurement, and a substrate treating apparatus including the same. The substrate treating liquid supply unit includes: a first reservoir connected to an inkjet head unit for jetting a substrate treating liquid onto a substrate and providing the substrate treating liquid to the inkjet head unit; a water level sensor measuring a water level of the substrate treating liquid stored in the first reservoir; and a pressure control module compensating for a pressure provided to the first reservoir based on an amount variation in the water level of the substrate treating liquid, wherein a liquid level of a nozzle of the inkjet head unit is constantly maintained.
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公开(公告)号：US11752530B2
公开(公告)日：2023-09-12
申请号：US17073338
申请日：2020-10-17
Applicant: SEMES CO., LTD.
Inventor： Woo Sin Jung , Sang Eun Noh , Dae Sung Kim
CPC classification number: B08B3/14 , B08B3/12 , B08B13/00 , H01L21/02057
Abstract: A fluid discharging device includes a body member including an entrance configured to receive fluid and a passage line through which the fluid is transferred to a chamber, and a first foreign material removing unit coupled to the body member, and expanding and restoring such that foreign materials accumulated on a surface of the first foreign material removing unit is removed.
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10.发明申请公开(公告)号：US20230031300A1
公开(公告)日：2023-02-02
申请号：US17851029
申请日：2022-06-28
Applicant: SEMES CO., LTD.
Inventor： Dong Hwa Lee , Dai Geon Yoon , Soo Hong Lee , Ji Hyeon Kim , Dae Sung Kim
IPC: B41J2/175
Abstract: Provided are a substrate treating liquid supply unit for constantly maintaining a liquid level of a nozzle of an inkjet head unit through real-time water level measurement, and a substrate treating apparatus including the same. The substrate treating liquid supply unit includes: a first reservoir connected to an inkjet head unit for jetting a substrate treating liquid onto a substrate and providing the substrate treating liquid to the inkjet head unit; a water level sensor measuring a water level of the substrate treating liquid stored in the first reservoir; and a pressure control module compensating for a pressure provided to the first reservoir based on an amount variation in the water level of the substrate treating liquid, wherein a liquid level of a nozzle of the inkjet head unit is constantly maintained.
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