Invention Grant
- Patent Title: Method for manufacturing circuit board including metal-containing layer
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Application No.: US17511572Application Date: 2021-10-27
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Publication No.: US11770903B2Publication Date: 2023-09-26
- Inventor: Ji Young Byun , Kwang-Deok Choi , Honguk Cheon
- Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Seoul
- Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Seoul
- Agency: CANTOR COLBURN LLP
- Priority: KR 20200140262 2020.10.27 KR 20200140263 2020.10.27
- Main IPC: H05K3/38
- IPC: H05K3/38 ; C23C18/18 ; C23C18/31 ; C23C28/02 ; C23F1/02 ; C23F17/00 ; C25D5/34 ; C25D5/48 ; H05K3/06 ; H05K3/10 ; H05K1/03 ; H05K1/09

Abstract:
Provided is a method for manufacturing a circuit board including: (a) preparing a mixture of a metal powder, an anti-sintering agent, and an activator; (b) immersing a dielectric substrate in the mixture; (c) forming a metal-containing layer on the surface of the dielectric substrate by heating the mixture under an inert atmosphere or under a reducing atmosphere; (d) forming a first metal layer on the metal-containing layer by electroless plating and forming a second metal layer thereon by electroplating; and (e) forming a metal pattern on the dielectric substrate, wherein the first metal layer includes Cu, Ni, Co, Au, Pd, or an alloy thereof, the second metal layer includes Cu, Ni, Fe, Co, Cr, Zn, Au, Ag, Pt, Pd, Rh, or an alloy thereof, and the method further includes performing heat treatment at least once after step (c).
Public/Granted literature
- US20220132676A1 METHOD FOR MANUFACTURING CIRCUIT BOARD INCLUDING METAL-CONTAINING LAYER Public/Granted day:2022-04-28
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