- 专利标题： Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
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申请号： US16849793申请日： 2020-04-15
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公开(公告)号： US11814747B2公开(公告)日： 2023-11-14
- 发明人: John Tolle , Joseph P. Margetis
- 申请人： ASM IP Holding B.V.
- 申请人地址： NL Almere
- 专利权人： ASM IP Holding B.V.
- 当前专利权人： ASM IP Holding B.V.
- 当前专利权人地址： NL Almere
- 代理机构： Snell & Wilmer L.L.P.
- 主分类号： C30B31/16
- IPC分类号： C30B31/16 ; C30B25/14 ; C30B25/16 ; C30B25/18 ; C30B25/08 ; H01L21/67
摘要：
Gas-phase reactor systems and methods suitable for use with precursors that are solid phase at room temperature and pressure are disclosed. The systems and methods as described herein can be used to, for example, form amorphous, polycrystalline, or epitaxial layers (e.g., one or more doped semiconductor layers) on a surface of a substrate.
公开/授权文献
- US20200340138A1 GAS-PHASE REACTOR SYSTEM AND METHOD OF USING SAME 公开/授权日：2020-10-29
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