Invention Grant
- Patent Title: Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
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Application No.: US17718047Application Date: 2022-04-11
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Publication No.: US11842883B2Publication Date: 2023-12-12
- Inventor: Jong-hoon Park , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi , Kyungjoo Min , Wonwoong Park
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-Si
- Agency: Innovation Counsel LLP
- Priority: KR 20170087963 2017.07.11
- The original application number of the division: US15994486 2018.05.31
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/44 ; C23C16/505 ; C23C16/455 ; C23C16/509 ; H10K71/00 ; C23C16/34 ; H10K71/16
Abstract:
A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
Public/Granted literature
- US20220238306A1 CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME Public/Granted day:2022-07-28
Information query
