- 专利标题： Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
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申请号： US17718047申请日： 2022-04-11
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公开(公告)号： US11842883B2公开(公告)日： 2023-12-12
- 发明人: Jong-hoon Park , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi , Kyungjoo Min , Wonwoong Park
- 申请人： Samsung Display Co., Ltd.
- 申请人地址： KR Yongin-si
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR Yongin-Si
- 代理机构： Innovation Counsel LLP
- 优先权： KR 20170087963 2017.07.11
- 分案原申请号： US15994486 2018.05.31
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C16/44 ; C23C16/505 ; C23C16/455 ; C23C16/509 ; H10K71/00 ; C23C16/34 ; H10K71/16
摘要：
A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
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