- 专利标题: Non-volatile semiconductor storage device and method of manufacturing the same
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申请号: US17843320申请日: 2022-06-17
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公开(公告)号: US11844218B2公开(公告)日: 2023-12-12
- 发明人: Yoshiaki Fukuzumi , Ryota Katsumata , Masaru Kidoh , Masaru Kito , Hiroyasu Tanaka , Yosuke Komori , Megumi Ishiduki , Hideaki Aochi
- 申请人: KIOXIA CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: KIOXIA CORPORATION
- 当前专利权人: KIOXIA CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP 07320215 2007.12.11
- 分案原申请号: US16204444 2018.11.29
- 主分类号: H01L29/51
- IPC分类号: H01L29/51 ; H10B43/27 ; G11C16/04 ; H10B41/27 ; H10B43/20 ; H10B43/40 ; H10B43/50 ; H10B99/00 ; H10B41/20
摘要:
A non-volatile semiconductor storage device has a plurality of memory strings to each of which a plurality of electrically rewritable memory cells are connected in series. Each of the memory strings includes first semiconductor layers each having a pair of columnar portions extending in a vertical direction with respect to a substrate and a coupling portion formed to couple the lower ends of the pair of columnar portions; a charge storage layer formed to surround the side surfaces of the columnar portions; and first conductive layers formed to surround the side surfaces of the columnar portions and the charge storage layer. The first conductive layers function as gate electrodes of the memory cells.
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