Invention Grant
- Patent Title: Alternative oxidizing agents for cobalt CMP
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Application No.: US15649378Application Date: 2017-07-13
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Publication No.: US11851584B2Publication Date: 2023-12-26
- Inventor: Steven Kraft , Phillip W. Carter , Andrew R. Wolff
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: CMC MATERIALS, INC.
- Current Assignee: CMC MATERIALS, INC.
- Current Assignee Address: US IL Aurora
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; H01L21/321 ; H01L21/768
Abstract:
The invention provides a chemical-mechanical polishing composition comprising (a) an abrasive, (b) a cobalt accelerator, and (c) an oxidizing agent that oxidizes a metal, wherein the polishing composition has a pH of about 4 to about 10. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains cobalt.
Public/Granted literature
- US20180016469A1 ALTERNATIVE OXIDIZING AGENTS FOR COBALT CMP Public/Granted day:2018-01-18
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