发明授权
- 专利标题: System and methods for electrokinetic loading of sub-micron-scale reaction chambers
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申请号: US17350509申请日: 2021-06-17
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公开(公告)号: US11932906B2公开(公告)日: 2024-03-19
- 发明人: Guojun Chen , Jeremy Lackey , Alexander Goryaynov , Gerard Schmid , Ali Kabiri , Jonathan M. Rothberg , Todd Rearick , Jonathan C. Schultz , Farshid Ghasemi , Keith G. Fife
- 申请人: Quantum-Si Incorporated
- 申请人地址: US CT Guilford
- 专利权人: Quantum-Si Incorporated
- 当前专利权人: Quantum-Si Incorporated
- 当前专利权人地址: US CT Branford
- 代理机构: Wolf, Greenfield & Sacks, P.C.
- 分案原申请号: US16239789 2019.01.04
- 主分类号: C12Q1/6869
- IPC分类号: C12Q1/6869 ; B01L3/00 ; C08L1/02 ; C12Q1/6806 ; G01N21/64 ; G01N27/447 ; G01N30/86 ; G01N30/88
摘要:
Apparatus and techniques for electrokinetic loading of samples of interest into sub-micron-scale reaction chambers are described. Embodiments include an integrated device and related apparatus for analyzing samples in parallel. The integrated device may include at least one reaction chamber formed through a surface of the integrated device and configured to receive a sample of interest, such as a molecule of nucleic acid. The integrated device may further include electrodes patterned adjacent to the reaction chamber that produce one or more electric fields that assist loading the sample into the reaction chamber. The apparatus may further include a sample reservoir having a fluid seal with the surface of the integrated device and configured to hold a suspension containing the samples.
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