Invention Grant
- Patent Title: Semiconductor memory device and method for manufacturing same
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Application No.: US17328030Application Date: 2021-05-24
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Publication No.: US11956959B2Publication Date: 2024-04-09
- Inventor: Jun Fujiki , Shinya Arai , Kotaro Fujii
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP 17247987 2017.12.25
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H01L21/768 ; H01L27/07 ; H10B43/35 ; H10B43/40

Abstract:
A semiconductor memory device includes a semiconductor substrate including a diode formed in an upper layer portion of the semiconductor substrate, a first insulating film provided above the semiconductor substrate, a first conductive film provided above the first insulating film and coupled to the diode, a stacked body provided above the first conductive film, an insulator and an electrode film being stacked alternately in the stacked body, a semiconductor member piercing the stacked body and being connected to the first conductive film, and a charge storage member provided between the electrode film and the semiconductor member.
Public/Granted literature
- US20210280603A1 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2021-09-09
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