Invention Grant
- Patent Title: Magnetic device structure and methods of forming the same
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Application No.: US17408145Application Date: 2021-08-20
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Publication No.: US12022664B2Publication Date: 2024-06-25
- Inventor: Jui-Lin Chen , Chenchen Jacob Wang , Hsin-Wen Su , Ping-Wei Wang , Yuan-Hao Chang , Po-Sheng Lu , Shih-Hao Lin
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: NZ Carr Law Office
- Main IPC: H10B61/00
- IPC: H10B61/00 ; H10N50/80

Abstract:
A magnetic device structure is provided. In some embodiments, the structure includes one or more first transistors, a magnetic device disposed over the one or more first transistors, a plurality of magnetic columns surrounding sides of the one or more first transistors and the magnetic device, a first magnetic layer disposed over the magnetic device and in contact with the plurality of magnetic columns, and a second magnetic layer disposed below the one or more first transistors and in contact with the plurality of magnetic columns.
Public/Granted literature
- US20220328561A1 MAGNETIC DEVICE STRUCTURE AND METHODS OF FORMING THE SAME Public/Granted day:2022-10-13
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