Invention Grant
- Patent Title: Magnetic tunnel junction devices
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Application No.: US18474173Application Date: 2023-09-25
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Publication No.: US12302761B2Publication Date: 2025-05-13
- Inventor: Hsi-Wen Tien , Wei-Hao Liao , Pin-Ren Dai , Chih-Wei Lu , Chung-Ju Lee
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: H10N50/10
- IPC: H10N50/10 ; G11C11/16 ; H01L23/522 ; H10B61/00 ; H10N50/01 ; H10N50/80 ; H10N50/85

Abstract:
A device includes a first dielectric layer, a magnetic tunnel junction (MTJ), an oxide layer, a cap layer, and a second dielectric layer. The MTJ is over the first dielectric layer. The oxide layer is over the first dielectric layer. The cap layer is over the first dielectric layer. The cap layer is in contact with a sidewall of the MTJ and a sidewall of the oxide layer. The second dielectric layer is over the cap layer.
Public/Granted literature
- US20240016064A1 MAGNETIC TUNNEL JUNCTION DEVICES Public/Granted day:2024-01-11
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