Invention Application
- Patent Title: Polishing material for silicon nitride and sialon ceramics
- Patent Title (中): 氮化硅和赛隆陶瓷抛光材料
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Application No.: US10292491Application Date: 2002-11-13
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Publication No.: US20030136057A1Publication Date: 2003-07-24
- Inventor: Kiyoshi Hirao , Shuji Sakaguchi , Yukihiko Yamauchi , Shuzo Kanzaki , Takeshi Sato
- Applicant: National Inst. of Advanced Ind. Science and Tech.
- Applicant Address: JP Tokyo
- Assignee: National Inst. of Advanced Ind. Science and Tech.
- Current Assignee: National Inst. of Advanced Ind. Science and Tech.
- Current Assignee Address: JP Tokyo
- Priority: JP2001-348455 20011114
- Main IPC: C09K003/14
- IPC: C09K003/14 ; C09G001/02 ; C09G001/04
Abstract:
The present invention provides a novel polishing material with which silicon nitride ceramic and sialon ceramic can be polished at high efficiency through a tribochemical reaction, and a method for manufacturing thereof, said material is used for polishing a silicon nitride ceramic or sialon ceramic as a material being polished, through a tribochemical reaction, and consists of a ceramic sinter containing an element that causes the ceramic being polished to undergo a dissolution reaction at the grain boundary of the sinter, within the particles thereof, and/or in pores thereof.
Information query
