公开(公告)号：US20030136057A1

公开(公告)日：2003-07-24

申请号：US10292491

申请日：2002-11-13

Applicant: National Inst. of Advanced Ind. Science and Tech.

Inventor： Kiyoshi Hirao ,  Shuji Sakaguchi ,  Yukihiko Yamauchi ,  Shuzo Kanzaki ,  Takeshi Sato

IPC: C09K003/14 ,  C09G001/02 ,  C09G001/04

CPC classification number: C09K3/1418 ,  C09G1/02

Abstract: The present invention provides a novel polishing material with which silicon nitride ceramic and sialon ceramic can be polished at high efficiency through a tribochemical reaction, and a method for manufacturing thereof, said material is used for polishing a silicon nitride ceramic or sialon ceramic as a material being polished, through a tribochemical reaction, and consists of a ceramic sinter containing an element that causes the ceramic being polished to undergo a dissolution reaction at the grain boundary of the sinter, within the particles thereof, and/or in pores thereof.

Abstract translation: 本发明提供了一种新型的抛光材料，可以通过摩擦化学反应高效地研磨氮化硅陶瓷和赛隆陶瓷及其制造方法，所述材料用于抛光氮化硅陶瓷或赛隆陶瓷作为材料 通过摩擦化学反应被抛光，并且由陶瓷烧结体组成，该陶瓷烧结体含有使抛光的陶瓷在其烧结体的晶界，其颗粒内和/或其孔内进行溶解反应的元素。