Abrasion resistant aluminum oxide member and method of production thereof
    1.
    发明申请
    Abrasion resistant aluminum oxide member and method of production thereof 审中-公开
    耐磨铝氧化物及其制造方法

    公开(公告)号:US20040033394A1

    公开(公告)日:2004-02-19

    申请号:US10458226

    申请日:2003-06-11

    Abstract: It is an object to provide an aluminum oxide-based sintered body and a manufacturing method thereof, according to which all of wear resistance, strength and fracture toughness can be exhibited to a high degree in a single sintered body, and there is provided a method of manufacturing a multi-layer aluminum oxide sintered body having high strength and wear resistance as well as high fracture toughness, that has a structure of at least two layers in which a surface layer is a high-strength wear-resistant layer comprising isometric crystals having a small grain size, and an inner part is a high-fracture-toughness layer constituted from anisotropic crystals, the method comprising the steps of (1) preparing a layered body by forming a layer of an aluminum oxide material that has a purity of at least 90% and contains a grain growth inhibiting agent and a layer of an aluminum oxide material that has a purity of at least 90% and contains a grain growth promoting agent, (2) carrying out setting such that the sintering characteristics and the forming density of the two layers of the layered body under pressureless sintering become approximately the same; and (3) sintering the two layers simultaneously in a single step, and a product manufactured using this method is also provided.

    Abstract translation: 本发明的目的是提供一种氧化铝基烧结体及其制造方法,其中,在单个烧结体中可以高度地显示出耐磨性,强度和断裂韧性全部,并且提供了一种方法 制造具有高强度和耐磨性以及高断裂韧性的多层氧化铝烧结体,其具有至少两层的结构,其中表面层是高强度耐磨层,其包含等轴晶体,其具有 小颗粒尺寸,内部是由各向异性晶体构成的高断裂韧性层,该方法包括以下步骤:(1)通过形成具有纯度的氧化铝材料层 至少90%,并且含有晶粒生长抑制剂和纯度至少为90%的氧化铝材料层,并且含有谷粒生长促进剂,(2)进行凝固 使得在无压烧结下层叠体的两层的烧结特性和形成密度变得大致相同; 和(3)在一个步骤中同时烧结两层,并且还提供使用该方法制造的产品。

    Polishing material for silicon nitride and sialon ceramics
    2.
    发明申请
    Polishing material for silicon nitride and sialon ceramics 审中-公开
    氮化硅和赛隆陶瓷抛光材料

    公开(公告)号:US20030136057A1

    公开(公告)日:2003-07-24

    申请号:US10292491

    申请日:2002-11-13

    CPC classification number: C09K3/1418 C09G1/02

    Abstract: The present invention provides a novel polishing material with which silicon nitride ceramic and sialon ceramic can be polished at high efficiency through a tribochemical reaction, and a method for manufacturing thereof, said material is used for polishing a silicon nitride ceramic or sialon ceramic as a material being polished, through a tribochemical reaction, and consists of a ceramic sinter containing an element that causes the ceramic being polished to undergo a dissolution reaction at the grain boundary of the sinter, within the particles thereof, and/or in pores thereof.

    Abstract translation: 本发明提供了一种新型的抛光材料,可以通过摩擦化学反应高效地研磨氮化硅陶瓷和赛隆陶瓷及其制造方法,所述材料用于抛光氮化硅陶瓷或赛隆陶瓷作为材料 通过摩擦化学反应被抛光,并且由陶瓷烧结体组成,该陶瓷烧结体含有使抛光的陶瓷在其烧结体的晶界,其颗粒内和/或其孔内进行溶解反应的元素。

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