Invention Application
US20050008975A1 Resist composition comprising photosensitive polymer having lactone in its backbone
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抗蚀剂组合物包含其主链中具有内酯的光敏聚合物
- Patent Title: Resist composition comprising photosensitive polymer having lactone in its backbone
- Patent Title (中): 抗蚀剂组合物包含其主链中具有内酯的光敏聚合物
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Application No.: US10909384Application Date: 2004-08-03
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Publication No.: US20050008975A1Publication Date: 2005-01-13
- Inventor: Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
- Applicant: Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
- Priority: KR2000-39562 20000711; KR2000-75485 20001212
- Main IPC: C08F220/18
- IPC: C08F220/18 ; C08F222/06 ; C08F232/04 ; C08F234/02 ; G03F7/004 ; G03F7/039 ; H01L21/027 ; G03C1/76
Abstract:
A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer is polymerized with (a) at least one of the monomers having the respective formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x and y are independently integers from 1 to 6, and (b) at least one of a (meth)acrylate monomer, a maleic anhydride monomer, and a norbornene monomer.
Public/Granted literature
- US07241552B2 Resist composition comprising photosensitive polymer having lactone in its backbone Public/Granted day:2007-07-10
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