发明申请
- 专利标题: Field effect transistor and method for manufacturing the same
- 专利标题(中): 场效应晶体管及其制造方法
-
申请号: US11048369申请日: 2005-01-31
-
公开(公告)号: US20050176186A1公开(公告)日: 2005-08-11
- 发明人: Choong-Ho Lee , Jae-Man Yoon , Dong-Gun Park , Chul Lee
- 申请人: Choong-Ho Lee , Jae-Man Yoon , Dong-Gun Park , Chul Lee
- 优先权: KR2004-8590 20040210
- 主分类号: H01L21/28
- IPC分类号: H01L21/28 ; H01L21/00 ; H01L21/336 ; H01L21/8234 ; H01L21/84 ; H01L27/08 ; H01L27/088 ; H01L27/092 ; H01L29/423 ; H01L29/49 ; H01L29/76 ; H01L29/78 ; H01L29/786 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119
摘要:
In one embodiment, a semiconductor device includes a semiconductor substrate having a lower layer and an upper layer overlying the lower layer. The upper layer is arranged and structured to form first and second active regions that are spaced apart from each other and protrude from an upper surface of the lower layer. A third active region of a bridge shape is distanced vertically from the upper surface of the lower layer and connects the first and second active regions. The device further includes a gate electrode, which is formed with a gate insulation layer surrounding the third active region, so that the third active region functions as a channel.
公开/授权文献
信息查询
IPC分类: