发明申请
- 专利标题： Substrate carrier for parallel wafer processing reactor
- 专利标题（中）： 用于平行晶片处理反应器的基板载体
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申请号： US10966245申请日： 2004-10-15
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公开(公告)号： US20050188923A1公开(公告)日： 2005-09-01
- 发明人: Robert Cook , Ronald Stevens , Peter Schwartz , Cesar Tejamo , Vebjorn Nilsen , Gabriel Ormonde , Ajit Paranjpe , Somnath Nag , Michael Patten
- 申请人： Robert Cook , Ronald Stevens , Peter Schwartz , Cesar Tejamo , Vebjorn Nilsen , Gabriel Ormonde , Ajit Paranjpe , Somnath Nag , Michael Patten
- 主分类号： C23C16/24
- IPC分类号： C23C16/24 ; C23C16/34 ; C23C16/44 ; C23C16/455 ; C23C16/458 ; C23C16/46 ; C23C16/48 ; C23C16/509 ; C23C16/54 ; H01J37/32 ; H01L21/00 ; H01L21/205 ; H01L21/318 ; H01L21/673 ; H01L21/677 ; C23C16/00
摘要：
A substrate carrier for a parallel wafer processing reactor supports a plurality of substrates. The substrate carrier includes a plurality of susceptors, which may be thermal plates or annular rings that are arranged horizontally in a vertical stack. The substrates are mounted between pairs of susceptors on two or more supports provided around the outer periphery of the susceptors. The number of substrates mounted between each pair of susceptors may the same or different but is two or more between at least one pair of susceptors.