发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US10896000申请日： 2004-07-22
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公开(公告)号： US20060017894A1公开(公告)日： 2006-01-26
- 发明人: Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
- 申请人： Tjarko Adriaan Van Empel , Erik Loopstra , Antonius Van Der Net , Yuri Johannes Van De Vijver , Bernhard Gellrich , Bauke Jansen , Rens Sanderse
- 申请人地址： NL DR Veldhoven
- 专利权人： ASML NETHERLAND B.V.
- 当前专利权人： ASML NETHERLAND B.V.
- 当前专利权人地址： NL DR Veldhoven
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
公开/授权文献
- US07446849B2 Lithographic apparatus and device manufacturing method 公开/授权日：2008-11-04
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