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    Lithographic apparatus and device manufacturing method
    1.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060017894A1

    公开(公告)日：2006-01-26

    申请号：US10896000

    申请日：2004-07-22

    申请人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

    发明人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70933 ,  G03F7/70908

    摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

    摘要翻译： 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

    Lithographic apparatus and device manufacturing method
    3.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070263201A1

    公开(公告)日：2007-11-15

    申请号：US11433767

    申请日：2006-05-15

    申请人： Erik Loopstra ,  Joost Ottens

    发明人： Erik Loopstra ,  Joost Ottens

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/707

    摘要： An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

    摘要翻译： 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置，其中通道配置包括输入通道结构和输出通道结构，输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

    Optical element for correction of aberration, and a lithographic apparatus comprising same
    4.
    发明申请
    Optical element for correction of aberration, and a lithographic apparatus comprising same 有权
    用于校正像差的光学元件，以及包括其的光刻设备

    公开(公告)号：US20070247605A1

    公开(公告)日：2007-10-25

    申请号：US11410282

    申请日：2006-04-25

    申请人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

    发明人： Erik Loopstra ,  Paul Graupner ,  Johannes Mulkens

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G02B27/0068 ,  G03F7/70266

    摘要： An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

    摘要翻译： 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离，以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

    Lithographic apparatus and device manufacturing method
    5.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070216881A1

    公开(公告)日：2007-09-20

    申请号：US11377636

    申请日：2006-03-17

    申请人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

    发明人： Harmen Van Der Schoot ,  Erik Loopstra ,  Fransicus Jacobs ,  Godfried Franciscus Geelen

    IPC分类号： G03B27/42

    CPC分类号： G03B27/42 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

    摘要： A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

    摘要翻译： 提供了可移动构件，其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置，在缩回位置，其不再延伸超过保险杠。 以这种方式，可以将两个基板台移动到一起，并允许可伸缩构件在液体供应系统之下通过，该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。

    Imprint lithography
    9.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20060266244A1

    公开(公告)日：2006-11-30

    申请号：US11139991

    申请日：2005-05-31

    申请人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

    发明人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

    IPC分类号： B41F1/34

    CPC分类号： B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

    摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

    摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

    Active faceted mirror system for lithography
    10.
    发明授权
    Active faceted mirror system for lithography 有权
    用于光刻的主动分面镜系统

    公开(公告)号：US07136214B2

    公开(公告)日：2006-11-14

    申请号：US10986076

    申请日：2004-11-12

    申请人： Erik Loopstra ,  Stephen Roux

    发明人： Erik Loopstra ,  Stephen Roux

    IPC分类号： G02B26/00

    CPC分类号： G02B27/0977 ,  G02B7/1827 ,  G02B27/0905 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70291

    摘要： An active faceted mirror system is disclosed. The active faceted mirror system includes a set of active facet mirror devices, a base plate and a set of pins for mounting the active facet mirror devices to the base plate. Each of the active facet mirror devices includes a mirror substrate with a reflective surface and a bearing hole on the reverse side for mounting. Additionally, each of the active facet mirror devices includes at least three actuator targets located on the back side of the mirror substrate, a jewel bearing and a flexure for supporting the mirror substrate. The base plate includes a series of bearing holes for mounting the active facet mirror devices and at least three actuators for each of the active facet mirror devices. A set of facet controllers located on the base plate can be used to control the positioning of the active facet mirror devices to produce a desired illumination effect.

    摘要翻译： 公开了一种主动刻面镜系统。 主动分面镜系统包括一组主动分面镜装置，底板和一组用于将活动小面镜装置安装到基板的销。 每个活性刻面镜装置包括具有反射表面的反射镜基板和用于安装的反面上的轴承孔。 此外，每个活动刻面镜装置包括位于镜基板背面的至少三个致动器目标，宝石轴承和用于支撑镜面基板的挠曲件。 基板包括用于安装主动分面镜装置的一系列轴承孔和用于每个主动分面镜装置的至少三个致动器。 可以使用位于基板上的一组小面控制器来控制活动小面镜装置的定位以产生期望的照明效果。