公开(公告)号：US20060017894A1

公开(公告)日：2006-01-26

申请号：US10896000

申请日：2004-07-22

申请人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

摘要翻译： 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US20060055899A1

公开(公告)日：2006-03-16

申请号：US10937871

申请日：2004-09-10

申请人： Antonius Van Der Net ,  Tjarko Adriaan Van Empel ,  Ronald Van Der Ham

发明人： Antonius Van Der Net ,  Tjarko Adriaan Van Empel ,  Ronald Van Der Ham

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70883

摘要： A lithographic apparatus includes a support constructed to support a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an interior space through which an interferometer beam propagates, and a first gas supply for supplying a purge gas to inhibit contamination of the projection system. The purge gas has a predetermined refractive index. The apparatus also includes a second gas supply for supplying a conditioning gas to the interior space for conditioning the interior space, and a refractive index matching system arranged to match the refractive index of the conditioning gas to the predetermined refractive index of the purge gas.

摘要翻译： 光刻设备包括：支撑构件，用于支撑图案形成装置，该构图装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束;构造成保持衬底的衬底台;被配置为投影 图案化的辐射束到基板的目标部分，干涉仪光束传播的内部空间以及用于供应吹扫气体以抑制投影系统的污染的第一气体供应。 净化气体具有预定的折射率。 该设备还包括用于将调节气体供应到内部空间用于调节内部空间的第二气体供应源，以及折射率匹配系统，其布置成使调节气体的折射率与净化气体的预定折射率相匹配。

公开(公告)号：US20060033898A1

公开(公告)日：2006-02-16

申请号：US11205325

申请日：2005-08-17

申请人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

发明人： Theodorus Cadee ,  Johannes Jacobs ,  Nicolaas Kate ,  Erik Loopstra ,  Aschwin Lodewijk Vermeer ,  Jeroen Maria Mertens ,  Christianus De Mol ,  Marcel Hubertus Muitjens ,  Antonius Van Der Net ,  Joost Ottens ,  Johannes Quaedackers ,  Maria Reuhman-Huisken ,  Marco Stavenga ,  Patricius Tinnemans ,  Martinus Verhagen ,  Jacobus Johannus Hendricus Verspay ,  Frederik De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Smeets ,  Bart Schoondermark ,  Franciscus Janssen ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is disclosed having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.

摘要翻译： 公开了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。

公开(公告)号：US20060082746A1

公开(公告)日：2006-04-20

申请号：US10966108

申请日：2004-10-18

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Antonius Van Der Net ,  Franciscus Johannes Teunissen ,  Patricius Aloysius Tinnemans ,  Martinus Cornelis Verhagen ,  Jacobus Johannus Leonardus Verspay ,  Edwin Van Gompel

IPC分类号： G03B27/42

CPC分类号： G03F7/70716 ,  G03F7/70341

摘要： A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

公开(公告)号：US20050017198A1

公开(公告)日：2005-01-27

申请号：US10623180

申请日：2003-07-21

申请人： Antonius Van Der Net ,  Jeffrey Spiegelman ,  Johannus Van Bragt

发明人： Antonius Van Der Net ,  Jeffrey Spiegelman ,  Johannus Van Bragt

IPC分类号： G02B27/00 ,  G03F7/20 ,  G21G5/00

CPC分类号： G02B27/0006 ,  G03F7/70933

摘要： A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and a moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.

摘要翻译： 光刻投影设备包括被配置为支撑图案形成装置的支撑件，所述图案形成装置构造成根据期望的图案对投影光束进行图案化。 该装置具有构造成保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统。 该设备还具有净化气体供应系统，其构造成在光刻投影设备的部件的表面附近提供净化气体。 净化气体供应系统包括净化气体混合物发生器，其被配置为产生包括至少一个净化气体和水分的净化气体混合物。 净化气体混合物发生器具有保湿剂，其被配置为将湿气添加到净化气体中，以及净化气体混合物出口，其连接到净化气体混合物发生器，其构造成在表面附近提供净化气体混合物。

公开(公告)号：US20050286032A1

公开(公告)日：2005-12-29

申请号：US10873650

申请日：2004-06-23

申请人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

发明人： Joeri Lof ,  Johannes Catharinus Mulkens ,  Jeroen Johannes Mertens ,  Antonius Van Der Net ,  Ronald Van Der Ham ,  Nicolas Lallemant ,  Marcel Beckers

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70341 ,  G03F7/70808

摘要： A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

摘要翻译： 公开了一种光刻投影装置。 该装置包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置用于使辐射束在其横截面上具有图案。 该设备还包括被配置为保持基板的基板台，配置成将图案化的光束投影到基板的目标部分上的投影系统以及被配置成向流体提供流体的流体供应系统。 体积包括投影系统的至少一部分和/或照明系统的至少一部分。 该装置还包括配置成将流体供应系统耦合到衬底台，衬底，支撑结构，图案形成装置或其任何组合的耦合装置。

公开(公告)号：US20070114467A1

公开(公告)日：2007-05-24

申请号：US11525934

申请日：2006-09-25

申请人： Antonius Van Der Net ,  Erik Van Bragt

发明人： Antonius Van Der Net ,  Erik Van Bragt

IPC分类号： G01J3/10 ,  H05G2/00

CPC分类号： G02B27/0006 ,  G03F7/70933

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于支撑基板的基板支撑件，用于将图案化的辐射束投影到基板的目标部分上的投影系统和净化气体供应系统。 吹扫气体供应系统包括净化气体混合物发生器，其包括保湿剂，该保湿剂被布置成用于向吹扫气体中添加水分以产生吹扫气体混合物，以及净化气体混合物出口，其连接到吹扫气体混合物发生器， 混合物至光刻投影装置的至少一部分。

公开(公告)号：US20060055900A1

公开(公告)日：2006-03-16

申请号：US10941017

申请日：2004-09-15

申请人： Antonius Van Der Net ,  Paul Van Der Veen ,  Yuri Van De Vijver

发明人： Antonius Van Der Net ,  Paul Van Der Veen ,  Yuri Van De Vijver

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70925

摘要： A lithographic apparatus includes an illumination system for providing beam of radiation, and a support structure for supporting a patterning device. The patterning device imparts the beam of radiation with a pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a gas supply system for supplying a purge gas including oxygen to a plurality of spaces in the apparatus. The gas supply system is arranged so that the purge gas supplied to each of the plurality of spaces is a premixed purge gas mixture composed by the gas supply system for each of the plurality of spaces on the basis of a predetermined relationship that relates a desired amount of oxygen in the premixed purge gas mixture to the respective space to which that premixed purge gas mixture is supplied.

公开(公告)号：US20050051739A1

公开(公告)日：2005-03-10

申请号：US10894365

申请日：2004-07-20

申请人： Antonius Van Der Net ,  Jeffrey Spiegelman ,  Erik Johannus Van Bragt

发明人： Antonius Van Der Net ,  Jeffrey Spiegelman ,  Erik Johannus Van Bragt

IPC分类号： G02B27/00 ,  G03F7/20 ,  G21G5/00 ,  H01L21/425

CPC分类号： G02B27/0006 ,  G03F7/70933

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a purge gas supply system. The purge gas supply system includes a purge gas mixture generator that includes a moisturizer that is arranged for adding moisture to a purge gas to generate a purge gas mixture, and a purge gas mixture outlet connected to the purge gas mixture generator for supplying the purge gas mixture to at least part of the lithographic projection apparatus.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于支撑基板的基板支撑件，用于将图案化的辐射束投影到基板的目标部分上的投影系统和净化气体供应系统。 吹扫气体供应系统包括净化气体混合物发生器，其包括保湿剂，该保湿剂被布置成用于向吹扫气体中添加水分以产生吹扫气体混合物，以及净化气体混合物出口，其连接到吹扫气体混合物发生器， 混合物至光刻投影装置的至少一部分。