发明申请
US20110037960A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTEM AND METHOD FOR CLEANING A PATTERNING DEVICE
审中-公开
液晶显示装置，装置制造方法，清洁装置的清洁系统和方法
- 专利标题： LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTEM AND METHOD FOR CLEANING A PATTERNING DEVICE
- 专利标题（中）： 液晶显示装置，装置制造方法，清洁装置的清洁系统和方法
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申请号： US12989045申请日： 2009-04-16
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公开(公告)号： US20110037960A1公开(公告)日： 2011-02-17
- 发明人: Luigi Scaccabarozzi , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Pavel Stanislavoich Antsiferov , Vladimir Mihailovitch Krivtsun , Leonid Alexandrovich Dorokhin , Maarten Van Kampen
- 申请人： Luigi Scaccabarozzi , Vladimir Vitalevich Ivanov , Konstantin Nikolaevich Koshelev , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Pavel Stanislavoich Antsiferov , Vladimir Mihailovitch Krivtsun , Leonid Alexandrovich Dorokhin , Maarten Van Kampen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 国际申请： PCT/EP09/02782 WO 20090416
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.
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