公开(公告)号：US20110037960A1

公开(公告)日：2011-02-17

申请号：US12989045

申请日：2009-04-16

申请人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

发明人： Luigi Scaccabarozzi ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Pavel Stanislavoich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Leonid Alexandrovich Dorokhin ,  Maarten Van Kampen

IPC分类号： G03B27/52

CPC分类号： G03F7/70925

摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统和被配置为支撑图案形成装置的支撑结构。 图案形成装置被配置为向辐射束施加图案。 该装置包括图案形成装置清洁系统，该图案形成装置清洁系统被配置为向图案形成装置上的污染物颗粒提供静电力，并且由辐射束对其进行带电，以便从图案形成装置移除污染物颗粒。

公开(公告)号：US08493548B2

公开(公告)日：2013-07-23

申请号：US11882853

申请日：2007-08-06

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/32 ,  G03B27/42

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

公开(公告)号：US20090040491A1

公开(公告)日：2009-02-12

申请号：US11882853

申请日：2007-08-06

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  H05G2/00

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

摘要翻译： 光刻系统包括被配置为产生辐射的源，所述源包括阴极和阳极，所述阴极和阳极被配置为在位于放电空间中的燃料中产生放电以产生等离子体，所述放电空间包括 在使用中，配置成调整等离子体的辐射发射以控制由等离子体限定的体积的物质; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置为对所述辐射进行图案化以形成图案化的辐射束; 衬底支撑件，其构造成支撑衬底; 以及投影系统，被配置为将所述图案化的辐射束投射到所述基板上。

公开(公告)号：US20080148978A1

公开(公告)日：2008-06-26

申请号：US11643954

申请日：2006-12-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  B41M5/00

CPC分类号： G03F7/70291 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70558

摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

摘要翻译： 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。

公开(公告)号：US20110013167A1

公开(公告)日：2011-01-20

申请号：US12890256

申请日：2010-09-24

申请人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

发明人： Vladimir Mihailovitch KRIVTSUN ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Evgeny Dmitrievich Korop ,  Konstantin Nikolaevich Koshelev ,  Yurii Victorovitch Sidelnikov ,  Oleg Yakushev

IPC分类号： G03B27/54 ,  H01J3/14 ,  G03B27/42

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70983

摘要： An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

摘要翻译： 一种用于形成电磁辐射束的装置。 该装置包括等离子体辐射源，设置有基本上平行于来自等离子体源的辐射方向延伸的多个薄箔的箔陷阱以及设置在等离子体辐射源和箔捕获器之间的栅格。 一个空间位于网格和箔陷阱之间。 构造并布置电位施加电路以向电网施加电势，使得电网排斥由等离子体辐射源发射的电子，并在栅格和箔陷阱之间产生正空间电荷，以偏转由等离子体辐射发射的离子 来源于箔陷阱。 栅格和箔阱之间的距离至少等于箔阱的半径的一半。

公开(公告)号：US07872244B2

公开(公告)日：2011-01-18

申请号：US11889065

申请日：2007-08-08

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

IPC分类号： A61N5/00 ,  G01N21/64

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

摘要翻译： 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。

公开(公告)号：US07772570B2

公开(公告)日：2010-08-10

申请号：US11643954

申请日：2006-12-22

申请人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： A61N5/00

CPC分类号： G03F7/70291 ,  G03F7/70041 ,  G03F7/7055 ,  G03F7/70558

摘要： An assembly is provided for blocking a beam of radiation. The assembly has a pipe arranged to transmit at least part of the beam of radiation. The pipe has an inner surface provided with an ablation material and encloses a volume. The assembly further has an ablation generation device. The ablation generation device is arranged to ablate at least a portion of the ablation material upon reception of a blocking signal. The assembly has a control unit, which is arranged to control the ablation generation device.

摘要翻译： 提供用于阻挡辐射束的组件。 组件具有布置成透射辐射束的至少一部分的管。 管道具有设置有消融材料并包围体积的内表面。 组件还具有消融产生装置。 消融产生装置被布置成在接收到阻塞信号时烧蚀消融材料的至少一部分。 组件具有控制单元，其被布置成控制消融产生装置。

公开(公告)号：US20080266654A1

公开(公告)日：2008-10-30

申请号：US11790681

申请日：2007-04-26

申请人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G02B21/00

CPC分类号： G21K7/00

摘要： An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.

摘要翻译： 配置用于分析样品的极紫外（EUV）显微镜。 显微镜包括EUV辐射源，其被构造和布置成产生具有至少在约2-6nm范围内的波长的EUV辐射，以及构造和布置成用EUV辐射照射样品并收集一个 样品发出的辐射。 光学系统布置有至少一个反射镜，该反射镜包括多层结构，用于至少部分辐射在约2-6nm范围内的同相反射。

公开(公告)号：US20130287968A1

公开(公告)日：2013-10-31

申请号：US13926625

申请日：2013-06-25

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： H05H1/24

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission.

摘要翻译： 用于产生辐射的方法包括：将燃料供应到放电空间，在燃料中产生放电以形成等离子体，并且通过控制等离子体的辐射发射来减小由等离子体限定的体积。 所述还原包括向所述等离子体供给包括Ga，In，Bi，Pb或Al中的至少一种的物质以控制所述辐射发射。

公开(公告)号：US20090040492A1

公开(公告)日：2009-02-12

申请号：US11889065

申请日：2007-08-08

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Konstantin Nikolaevich Koshelev ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Dmitriy Victorovich Lopaev

IPC分类号： G03B27/54 ,  H01J17/26

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/005

摘要： A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.

摘要翻译： 公开了一种被配置为产生用于光刻设备的辐射的源。 源包括阳极和阴极。 阴极和阳极被配置为在阳极和阴极之间的放电空间中的燃料中产生放电，以便产生等离子体，阴极和阳极相对于彼此定位，使得在使用中，电流线延伸 在阳极和阴极之间基本上是弯曲的，从而产生基本上径向压缩等离子体的力，仅在接近阴极或阳极的上表面的区域中。