发明申请
- 专利标题: Phase-Modulated RF Power for Plasma Chamber Electrode
- 专利标题(中): 等离子室电极的相位调制RF功率
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申请号: US13005526申请日: 2011-01-12
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公开(公告)号: US20110192349A1公开(公告)日: 2011-08-11
- 发明人: Edward P. Hammond, IV , Tsutomu Tanaka , Christopher Boitnott , Jozef Kudela
- 申请人: Edward P. Hammond, IV , Tsutomu Tanaka , Christopher Boitnott , Jozef Kudela
- 主分类号: C23C16/509
- IPC分类号: C23C16/509
摘要:
A plurality of RF power signals have the same RF frequency as a reference RF signal and are coupled to respective RF connection points on an electrode of a plasma chamber. At least three of the RF connection points are not collinear. At least two of the RF power signals have time-varying phase offsets relative to the reference RF signal that are distinct functions of time. Such time-varying phase offsets can produce a spatial distribution of plasma in the plasma chamber having better time-averaged uniformity than the uniformity of the spatial distribution at any instant in time.
公开/授权文献
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