发明申请
- 专利标题: SEMICONDUCTOR LIGHT-EMITTING DEVICE AND PROCESS FOR PRODUCTION THEREOF
- 专利标题(中): 半导体发光器件及其制造方法
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申请号: US13439895申请日: 2012-04-05
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公开(公告)号: US20120187414A1公开(公告)日: 2012-07-26
- 发明人: Akira Fujimoto , Ryota Kitagawa , Koji Asakawa , Hidefumi Yasuda , Yasuhiko Akaike , Takeyuki Suzuki
- 申请人: Akira Fujimoto , Ryota Kitagawa , Koji Asakawa , Hidefumi Yasuda , Yasuhiko Akaike , Takeyuki Suzuki
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2009-000758 20090106
- 主分类号: H01L33/22
- IPC分类号: H01L33/22 ; H01L33/30
摘要:
One aspect of the present invention provides a semiconductor light-emitting device improved in luminance, and also provides a process for production thereof. The process comprises a procedure of forming a relief structure on the light-extraction surface of the device by use of a self-assembled film. In that procedure, the light-extraction surface is partly covered with a protective film so as to protect an area for an electrode to be formed therein. The electrode is then finally formed there after the procedure. The process thus reduces the area incapable, due to thickness of the electrode, of being provided with the relief structure. Between the electrode and the light-extraction surface, a contact layer is formed so as to establish ohmic contact between them.
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