发明申请
- 专利标题： ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME
- 专利标题（中）： 抗紫外线或辐射敏感性树脂组合物及其形成图案的方法
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申请号： US13421684申请日： 2012-03-15
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公开(公告)号： US20120231393A1公开(公告)日： 2012-09-13
- 发明人: Kana FUJII , Tomotaka TSUCHIMURA , Toru FUJIMORI , Hidenori TAKAHASHI , Takayuki ITO
- 申请人： Kana FUJII , Tomotaka TSUCHIMURA , Toru FUJIMORI , Hidenori TAKAHASHI , Takayuki ITO
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2009-214948 20090916
- 主分类号： G03F7/027
- IPC分类号： G03F7/027 ; G03F7/016 ; G03F7/20 ; G03F7/004
摘要：
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin that is decomposed when acted on by an acid to thereby increase its solubility in an alkali developer, a compound that generates an acid when exposed to actinic rays or radiation, and any of basic compounds of general formula (1) below.
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