Invention Application
- Patent Title: METHOD TO PRODUCE HIGHLY TRANSPARENT HYDROGENATED CARBON PROTECTIVE COATING FOR TRANSPARENT SUBSTRATES
- Patent Title (中): 生产用于透明基板的高透明加氢碳保护涂层的方法
-
Application No.: US13935993Application Date: 2013-07-05
-
Publication No.: US20140008214A1Publication Date: 2014-01-09
- Inventor: David Fang Wei Chen , David Ward Brown , Charles Liu , Samuel D. Harkness, IV
- Applicant: Intevac, Inc.
- Main IPC: C23C14/34
- IPC: C23C14/34

Abstract:
A physical vapor deposition (PVD) chamber for depositing a transparent and clear hydrogenated carbon, e.g., hydrogenated diamond-like carbon, film. A chamber body is configured for maintaining vacuum condition therein, the chamber body having an aperture on its sidewall. A plasma cage having an orifice is attached to the sidewall, such that the orifice overlaps the aperture. Two sputtering targets are situated on cathodes inside the plasma cage and are oriented opposite each other and configured to sustain plasma there-between and confined inside the plasma cage. The plasma inside the cage sputters material from the targets, which then passes through the orifice and aperture and lands on the substrate. The substrate is moved continuously in a pass-by fashion during the process.
Public/Granted literature
- US09605340B2 Method to produce highly transparent hydrogenated carbon protective coating for transparent substrates Public/Granted day:2017-03-28
Information query
IPC分类: