公开(公告)号：US20170152592A1

公开(公告)日：2017-06-01

申请号：US15432815

申请日：2017-02-14

Applicant: Intevac, Inc.

Inventor： David Fang Wei Chen ,  David Ward Brown ,  Charles Liu ,  Samuel D. Harkness, IV

IPC: C23C14/00 ,  C23C14/34 ,  C23C14/35 ,  C23C14/06 ,  H01J37/34

CPC classification number: C23C14/0057 ,  C23C14/0605 ,  C23C14/3464 ,  C23C14/35 ,  C23C14/562 ,  H01J37/3426

Abstract: A physical vapor deposition (PVD) chamber for depositing a transparent and clear hydrogenated carbon, e.g., hydrogenated diamond-like carbon, film. A chamber body is configured for maintaining vacuum condition therein, the chamber body having an aperture on its sidewall. A plasma cage having an orifice is attached to the sidewall, such that the orifice overlaps the aperture. Two sputtering targets are situated on cathodes inside the plasma cage and are oriented opposite each other and configured to sustain plasma there-between and confined inside the plasma cage. The plasma inside the cage sputters material from the targets, which then passes through the orifice and aperture and lands on the substrate. The substrate is moved continuously in a pass-by fashion during the process.

公开(公告)号：US20140008214A1

公开(公告)日：2014-01-09

申请号：US13935993

申请日：2013-07-05

Applicant: Intevac, Inc.

Inventor： David Fang Wei Chen ,  David Ward Brown ,  Charles Liu ,  Samuel D. Harkness, IV

IPC: C23C14/34

CPC classification number: C23C14/0057 ,  C23C14/0605 ,  C23C14/3464 ,  C23C14/35 ,  C23C14/562 ,  H01J37/3426

Abstract: A physical vapor deposition (PVD) chamber for depositing a transparent and clear hydrogenated carbon, e.g., hydrogenated diamond-like carbon, film. A chamber body is configured for maintaining vacuum condition therein, the chamber body having an aperture on its sidewall. A plasma cage having an orifice is attached to the sidewall, such that the orifice overlaps the aperture. Two sputtering targets are situated on cathodes inside the plasma cage and are oriented opposite each other and configured to sustain plasma there-between and confined inside the plasma cage. The plasma inside the cage sputters material from the targets, which then passes through the orifice and aperture and lands on the substrate. The substrate is moved continuously in a pass-by fashion during the process.

Abstract translation: 用于沉积透明且透明的氢化碳（例如氢化金刚石样碳）的物理气相沉积（PVD）室。 室主体被构造成用于在其中维持真空条件，腔体在其侧壁上具有孔。 具有孔口的等离子体保持架附接到侧壁，使得孔口与孔口重叠。 两个溅射靶位于等离子体笼内部的阴极上，并且彼此相对定向，并且被配置为在等离子体笼内保持等离子体并限制在其间。 笼内的等离子体从靶中溅出材料，然后其通过孔口和孔径并落在基底上。 在处理过程中，基板以传递方式连续移动。

公开(公告)号：US09896758B2

公开(公告)日：2018-02-20

申请号：US15432815

申请日：2017-02-14

Applicant: Intevac, Inc.

Inventor： David Fang Wei Chen ,  David Ward Brown ,  Charles Liu ,  Samuel D. Harkness, IV

IPC: C23C14/35 ,  C23C14/00 ,  C23C14/06 ,  H01J37/34 ,  C23C14/34

CPC classification number: C23C14/0057 ,  C23C14/0605 ,  C23C14/3464 ,  C23C14/35 ,  C23C14/562 ,  H01J37/3426

Abstract: A physical vapor deposition (PVD) chamber for depositing a transparent and clear hydrogenated carbon, e.g., hydrogenated diamond-like carbon, film. A chamber body is configured for maintaining vacuum condition therein, the chamber body having an aperture on its sidewall. A plasma cage having an orifice is attached to the sidewall, such that the orifice overlaps the aperture. Two sputtering targets are situated on cathodes inside the plasma cage and are oriented opposite each other and configured to sustain plasma there-between and confined inside the plasma cage. The plasma inside the cage sputters material from the targets, which then passes through the orifice and aperture and lands on the substrate. The substrate is moved continuously in a pass-by fashion during the process.

公开(公告)号：US09605340B2

公开(公告)日：2017-03-28

申请号：US13935993

申请日：2013-07-05

Applicant: Intevac, Inc.

Inventor： David Fang Wei Chen ,  David Ward Brown ,  Charles Liu ,  Samuel D. Harkness, IV

IPC: C23C14/35 ,  C23C14/34 ,  C23C14/00 ,  C23C14/06 ,  C23C14/56

CPC classification number: C23C14/0057 ,  C23C14/0605 ,  C23C14/3464 ,  C23C14/35 ,  C23C14/562 ,  H01J37/3426

Abstract: A physical vapor deposition (PVD) chamber for depositing a transparent and clear hydrogenated carbon, e.g., hydrogenated diamond-like carbon, film. A chamber body is configured for maintaining vacuum condition therein, the chamber body having an aperture on its sidewall. A plasma cage having an orifice is attached to the sidewall, such that the orifice overlaps the aperture. Two sputtering targets are situated on cathodes inside the plasma cage and are oriented opposite each other and configured to sustain plasma there-between and confined inside the plasma cage. The plasma inside the cage sputters material from the targets, which then passes through the orifice and aperture and lands on the substrate. The substrate is moved continuously in a pass-by fashion during the process.