Invention Application
- Patent Title: HIGH-PRESSURE CONTAINER, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING HIGH-PRESSURE CONTAINER
- Patent Title (中): 高压容器,基板加工装置及制造高压容器的方法
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Application No.: US14086146Application Date: 2013-11-21
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Publication No.: US20140145390A1Publication Date: 2014-05-29
- Inventor: Kazuyuki Mitsuoka , Gen You , Hiroki Ohno , Takehiko Orii , Takayuki Toshima , Hiroaki Inadomi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Priority: JP2012-261110 20121129
- Main IPC: B23Q3/18
- IPC: B23Q3/18 ; B23H7/08

Abstract:
In the present disclosure, the high-pressure chamber includes a chamber main body including a flat rectangular parallelepiped block of a metal which is formed with a flat cavity that serves as a substrate processing space in which a processing using a high-pressure fluid is performed on a substrate, and the substrate processing space being formed by machining the block from one of faces of the block other than the widest face towards another face opposing thereto. In a case where the cavity is constituted as a through hole, the though hole is provided with a cover configured to open or close the cavity on one side of the through hole, and a second block configured to air-tightly seal the cavity on the other side.
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Information query
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