Invention Application
US20150331314A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
审中-公开
图案形成方法，其使用的化合物，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件
- Patent Title: PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Patent Title (中): 图案形成方法，其使用的化合物，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，电子器件的制造方法和电子器件
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Application No.: US14811926Application Date: 2015-07-29
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Publication No.: US20150331314A1Publication Date: 2015-11-19
- Inventor: Shuhei YAMAGUCHI , Takamitsu TOMIGA , Fumihiro YOSHINO , Hajime FURUTANI , Michihiro SHIRAKAWA , Mitsuhiro FUJITA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2013-017949 20130131
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07D409/02 ; G03F7/32 ; C07C311/48 ; G03F7/038 ; G03F7/20
Abstract:
There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.
Public/Granted literature
- US1653927A Hand truck Public/Granted day:1927-12-27
Information query
IPC分类:
