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    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    4.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
    图案形成方法，丙烯酸敏感或辐射敏感性树脂组合物，丙烯酸敏感或辐射敏感膜，电子设备的制造方法和电子设备

    公开(公告)号：US20140242505A1

    公开(公告)日：2014-08-28

    申请号：US14272034

    申请日：2014-05-07

    Applicant: FUJIFILM Corporation

    Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO ,  Fumihiro YOSHINO

    IPC: G03F7/038

    CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern forming method including: (i) a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a Resin (P) including a non-acid-decomposable Repeating Unit (b1) represented by a following General Formula (b1) and a repeating unit including a group capable of being decomposed by acid and generating a polar group, and a Compound (B) capable of generating an acid through irradiation of actinic rays or irradiation; (ii) a process of exposing the film using actinic rays or radiation with a wavelength of equal to or less than 200 nm; and (iii) a process of developing the exposed film using a developer including an organic solvent containing a hetero atom and carbon atoms having 7 or more carbon atoms to forming a negative tone pattern.

    Abstract translation: 一种图案形成方法，包括：（i）使用含有由以下通式表示的非酸可分解重复单元（b1）的树脂（P）的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法 式（b1）和包含能够被酸分解并产生极性基团的基团的重复单元和能够通过光化射线照射或照射而产生酸的化合物（B）; （ii）使用光化射线或波长等于或小于200nm的辐射使膜曝光的方法; 和（iii）使用包含含有杂原子的有机溶剂和具有7个或更多个碳原子的碳原子的显影剂显影曝光的膜以形成负色调图案的方法。

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    6.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
    图案形成方法，抗紫外线敏感性或辐射敏感性树脂组合物，电阻膜，制造电子器件的方法和电子器件

    公开(公告)号：US20140087310A1

    公开(公告)日：2014-03-27

    申请号：US14093781

    申请日：2013-12-02

    Applicant: FUJIFILM Corporation

    Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Hidenori TAKAHASHI ,  Shoichi SAITOH ,  Fumihiro YOSHINO

    IPC: G03F7/038 ,  G03F7/20

    CPC classification number: G03F7/0382 ,  C08F220/12 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/325

    Abstract: A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.

    Abstract translation: 图案形成方法包括：（i）通过使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物包含：（A）含有具有能够通过酸的作用分解的基团的重复单元的树脂 以产生极性基团，（B）在用光化射线或辐射照射时能够产生酸的化合物，和（C）溶剂，（ii）暴露薄膜的步骤，和（iii）显影步骤 通过使用含有机溶剂的显影剂形成负图案的曝光膜，其中由下式（I）表示的重复单元的含量相对于树脂（A）中的所有重复单元和 树脂（A）含有除具有上述特定结构式的重复单元以外的非酚性芳香族基团的重复单元。

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