公开(公告)号：US20250004377A1

公开(公告)日：2025-01-02

申请号：US18424834

申请日：2024-01-28

Applicant: FUJIFILM Corporation

Inventor： Eiji FUKUZAKI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Taro MIYOSHI

IPC: G03F7/039 ,  C08F212/14 ,  C08F212/32 ,  C08F220/30 ,  C08F220/58 ,  C08F226/06 ,  C08K5/42 ,  G03F7/00 ,  G03F7/004 ,  G03F7/16

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a repeating unit (a) having a group that is decomposed by the action of an acid to generate a carboxylic acid and (B) a compound that generates an acid upon irradiation with an actinic ray or a radiation and is represented by a specified general formula (1). The repeating unit (a) is represented by a general formula (a), and the compound (B) is represented by a general formula (1).

公开(公告)号：US20240241443A1

公开(公告)日：2024-07-18

申请号：US18421987

申请日：2024-01-25

Applicant: FUJIFILM Corporation

Inventor： Eiji FUKUZAKI ,  Shuhei YAMAGUCHI ,  Tomoaki YOSHIOKA ,  Taro MIYOSHI

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/0392 ,  G03F7/0048

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having (A) a repeating unit having a group that is decomposed by the action of an acid to generate a carboxylic acid and represented by a specified general formula (a) and (B) a repeating unit having a group that is decomposed by irradiation with an actinic ray or a radiation to generate an acid and represented by a specified general formula (b), and a solvent including a solvent having a boiling point of 150° C. or more, a solvent having a boiling point of 150° C. or more being contained in 45 mass % or more with respect to the total amount of the solvent.

公开(公告)号：US20170168395A1

公开(公告)日：2017-06-15

申请号：US15444481

申请日：2017-02-28

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI

IPC: G03F7/038 ,  G03F1/50 ,  G03F7/32 ,  G03F7/20 ,  G03F7/38 ,  G03F7/004 ,  G03F7/16

CPC classification number: G03F7/038 ,  C08F220/26 ,  C08F220/30 ,  G03F1/50 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/38 ,  H01L21/0274

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) and a compound (B) exemplified below, the compound (B) has a specific structure within a molecule.

公开(公告)号：US20160280675A1

公开(公告)日：2016-09-29

申请号：US15176810

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Tomotaka TSUCHIMURA ,  Natsumi YOKOKAWA ,  Hidehiro MOCHIZUKI

IPC: C07D307/33 ,  G03F7/32 ,  G03F7/20 ,  G03F1/50 ,  G03F7/038

CPC classification number: C07D307/33 ,  C08F12/22 ,  C08F12/24 ,  C08F112/14 ,  C08F212/14 ,  C09D125/18 ,  G03F1/50 ,  G03F7/004 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/322 ,  C08F212/32 ,  C08F212/08

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

Abstract translation: 光化射线敏感性或辐射敏感性树脂组合物包括具有极性转换基团和碱溶性树脂的交联剂，其中极性转换基团是能够通过碱性水溶液的作用分解的基团，以产生 羧酸或磺酸在具有交联基团的一侧。

公开(公告)号：US20140308605A1

公开(公告)日：2014-10-16

申请号：US14315661

申请日：2014-06-26

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Hidenori TAKAHASHI ,  Shuhei YAMAGUCHI ,  Kei YAMAMOTO

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括（i）通过使用光化学射线敏感或辐射敏感性树脂组合物形成膜的步骤，所述树脂组合物含有（A）能够通过酸的作用增加极性的树脂，以减少 对于含有机溶剂的显影剂的溶解度，（B）在用光化学射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）基本上不含氟原子和硅原子的树脂 并且不同于树脂（A），（ii）曝光膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图案的步骤。

公开(公告)号：US20230408920A1

公开(公告)日：2023-12-21

申请号：US18458609

申请日：2023-08-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Taro MIYOSHI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition in which LWR of a pattern to be obtained is excellent; a resist film; a pattern forming method; and a method for manufacturing an electronic device.
The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having a group which is decomposed by action of acid to generate a polar group, in which the resin includes a repeating unit represented by General Formula (A2), and at least one of a requirement 1 or a requirement 2 is satisfied.



Requirement 1: the actinic ray-sensitive or radiation-sensitive resin composition contains a salt represented by General Formula (1)
Requirement 2: the resin has a residue formed by removing one hydrogen atom from the salt represented by General Formula (1)

公开(公告)号：US20190062526A1

公开(公告)日：2019-02-28

申请号：US16170732

申请日：2018-10-25

Applicant: FUJIFILM Corporation

Inventor： Yoshinori MAEDA ,  Shuhei YAMAGUCHI

IPC: C08K5/13 ,  B29C41/28 ,  C08J5/18 ,  C08K5/45 ,  C08K5/134 ,  G02B1/18 ,  G02B1/14

Abstract: A long film containing a cellulose acylate and a compound A having a molecular weight of less than 1,000 which satisfies conditions 1-4. Condition 1: containing two or more aromatic rings each directly connected to a hydroxyl group in a molecule. Condition 2: containing one or more carbon atoms directly connected to an aromatic ring directly connected to a hydroxyl group and do not constitute the aromatic ring in a molecule, the carbon atoms being directly connected to 1 to 3 aromatic rings. Condition 3: Each carbon atom directly connected to an aromatic ring directly connected to a hydroxyl group and not constituting the aromatic ring has no bond with a hydrogen atom. Condition 4: Each carbon atom directly connected to an aromatic ring directly connected to a hydroxyl group and not constituting the aromatic ring is bonded by a single bond to atoms other than hydrogen atoms.

公开(公告)号：US20160209747A1

公开(公告)日：2016-07-21

申请号：US15081089

申请日：2016-03-25

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI

IPC: G03F7/039 ,  G03F1/78 ,  G03F7/32 ,  G03F1/50 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F1/50 ,  G03F1/78 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/32 ,  G03F7/322

Abstract: There is provided an active light sensitive or radiation sensitive composition which contains (A) a compound that generates an acid by irradiation with active light or radiation, (P) a compound of which the solubility in alkali developers is increased due to the action of an acid, and (N) at least one specific compound, and which can satisfy high resolving power, an excellent pattern shape, and low line width roughness (LWR) at the same time to a high level in formation of a very fine pattern (for example, a line width of 50 nm or less), and a resist film, a pattern forming method, a resist-coated mask blank, a method for producing a photomask, a photomask, a method for manufacturing an electronic device, and an electronic device, each of which uses this active light sensitive or radiation sensitive composition.

Abstract translation: 提供了一种主动光敏或辐射敏感组合物，其包含（A）通过用活性光或辐射照射产生酸的化合物，（P）由于碱性显影剂的溶解度增加而导致的碱性显影剂的溶解度增加的化合物 酸和（N）至少一种特定化合物，并且能够在形成非常精细的图案的同时高效地满足高分辨能力，优异的图案形状和低线宽粗糙度（LWR）（对于 例如，线宽度为50nm以下）以及抗蚀剂膜，图案形成方法，抗蚀剂涂布掩模毛坯，光掩模的制造方法，光掩模，电子器件的制造方法以及电子学 装置，每个装置使用这种有源光敏或辐射敏感组合物。

公开(公告)号：US20140356771A1

公开(公告)日：2014-12-04

申请号：US14446599

申请日：2014-07-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Junichi ITO ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中， 重复单元（x）相对于树脂（C）中的所有重复单元为90％以上。

公开(公告)号：US20140045117A1

公开(公告)日：2014-02-13

申请号：US14035139

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Shohei KATAOKA ,  Shoichi SAITOH ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/28 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  C08F2220/283 ,  C08F220/42 ,  C08F2220/1825

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）能够通过酸的作用分解的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤 以产生由本说明书中定义的下式（I）表示的羧基，和（B）能够在用光化射线或辐射照射时产生酸的化合物; （ii）曝光胶片的步骤; 和（iii）通过使用含有有机溶剂的显影剂进行显影以形成负图案的步骤。