公开(公告)号：US20150331314A1

公开(公告)日：2015-11-19

申请号：US14811926

申请日：2015-07-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Mitsuhiro FUJITA

IPC: G03F7/004 ,  C07D409/02 ,  G03F7/32 ,  C07C311/48 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）具有能够通过酸的作用分解以产生极性基团的基团的树脂，（C1）含有能够产生的基团的化合物 通过光化射线或辐射照射后的第一酸性官能团和能够产生与光化射线或辐射照射时不同于第一酸性官能团的第二酸性官能团的基团，和（C2）至少一种含有两个 或更多选自由能够产生由光化射线或辐射照射的特定化学式表示的结构的基团组成的组。

公开(公告)号：US20230045851A1

公开(公告)日：2023-02-16

申请号：US17903158

申请日：2022-09-06

Applicant: FUJIFILM CORPORATION

Inventor： Naohiro TANGO ,  Michihiro SHIRAKAWA ,  Kyohei SAKITA ,  Akiyoshi GOTO ,  Kazunari YAGI ,  Mitsuhiro FUJITA

IPC: G03F7/039

Abstract: A method for producing a resist composition includes setting parameter, acquiring a pattern size for a regression analysis, analyzing performing a regression analysis, calculating a pattern size of a target resist composition based on the regression analysis, comparing the pattern size of the target resist composition and the target pattern size, determining a formulating amount of the resist composition in a case where a difference between the pattern size of the target resist composition and the target pattern size is within an allowable range, and producing a resist composition based on the determined formulating amount, in which, in a case where the difference is out of the allowable range, the method further includes changing at least the content of components in the target resist composition, and the formulating amount of the resist composition is determined based on the changed physical quantity to produce the resist composition.

公开(公告)号：US20220179307A1

公开(公告)日：2022-06-09

申请号：US17678271

申请日：2022-02-23

Applicant: FUJIFILM Corporation

Inventor： Akira TAKADA ,  Akiyoshi GOTO ,  Masafumi KOJIMA ,  Aina USHIYAMA ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Hironori OKA ,  Mitsuhiro FUJITA ,  Yasuharu SHIRAISHI

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin X including a repeating unit derived from a compound including two or more structural moieties consisting of an anionic moiety and a cationic moiety, and a polymerizable group, in which the compound generates an acid including an acidic moiety derived from the anionic moiety in the two or more structural moieties by irradiation with actinic rays or radiation.

公开(公告)号：US20200050106A1

公开(公告)日：2020-02-13

申请号：US16655447

申请日：2019-10-17

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Mitsuhiro FUJITA ,  Tomotaka TSUCHIMURA ,  Takashi KAWASHIMA ,  Michihiro OGAWA ,  Akihiro KANEKO ,  Hironori OKA ,  Yasuharu SHIRAISHI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

Abstract: A photosensitive composition for EUV light includes a predetermined resin and a photoacid generator, or includes a predetermined resin having a repeating unit having a photoacid generating group, and satisfies Conditions 1 and 2, Condition 1: The A value determined by Formula (1) is 0.14 or more, A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127)  Formula (1): Condition 2: The concentration of the solid content in the photosensitive composition for EUV light is 2.5% by mass or less.