公开(公告)号：US20240353753A1

公开(公告)日：2024-10-24

申请号：US18621915

申请日：2024-03-29

Applicant: FUJIFILM Corporation

Inventor： Asahi TAKAKI ,  Hideaki TSUBAKI ,  Takamitsu TOMIGA

IPC: G03F7/004

CPC classification number: G03F7/0045

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition having a concentration of solid contents of 15% or more, the resin composition containing (A) a resin including a repeating unit (a1) having an acid-decomposable group and a repeating unit (a2) having an aromatic ring, (B) a resin including a repeating unit (b1) represented by a specified general formula (1), and (C) a compound that generates an acid upon irradiation with an actinic ray or a radiation. A content of a repeating unit having an acid-decomposable group and included in the resin (B) is 5 mol % or less relative to all repeating units in the resin (B), and the resin (B) has a dispersity of less than 3.0.

公开(公告)号：US20180299777A1

公开(公告)日：2018-10-18

申请号：US16015358

申请日：2018-06-22

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Kenichi HARADA ,  Shinichi SUGIYAMA ,  Fumihiro YOSHINO ,  Shuji HIRANO

IPC: G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/039

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155° C. or higher, a compound (B) having a glass transition temperature of 150° C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130° C. to 170° C.

公开(公告)号：US20240053679A1

公开(公告)日：2024-02-15

申请号：US18362376

申请日：2023-07-31

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Sou KAMIMURA ,  Yoichi NISHIDA ,  Hideaki TSUBAKI

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/2006

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) undergoing an increase in alkali solubility due to action of acid; a compound (C) generating acid upon irradiation with an actinic ray or radiation; and a solvent (S) including a solvent SA having a boiling point of 130° C. to 150° C. and a solvent SB having a boiling point of 155° C. to 250° C., in which a content of the solvent SA is higher than a content of the solvent SB, the content of the solvent SB relative to the whole solvent is 1% to 30% by mass, and a concentration of solid contents is 10% by mass or more.

公开(公告)号：US20180217497A1

公开(公告)日：2018-08-02

申请号：US15939295

申请日：2018-03-29

Applicant: FUJIFILM Corporation

Inventor： Fumihiro YOSHINO ,  Kenichi HARADA ,  Shinichi SUGIYAMA ,  Takamitsu TOMIGA

IPC: G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/004 ,  G03F7/40 ,  G03F7/038

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides a pattern forming method which can be suitably applied to grayscale exposure since a deviation of the thickness among production lots is hardly generated, and an actinic ray-sensitive or radiation-sensitive resin composition. The pattern forming method of the present invention is a pattern forming method having a step A of forming a film having a thickness T on a substrate, using an actinic ray-sensitive or radiation-sensitive resin composition including a resin whose solubility in a developer changes by the action of an acid and an acid generator, a step B of exposing the film, and a step C of developing the exposed film using a developer to form a pattern, in which the film formed in the step A satisfies at least one of the following condition 1 or 2.Condition 1: In a case where the thickness T of the film is 800 nm or more, the value of γ is less than 10,000.Condition 2: In a case where the thickness T of the film is less than 800 nm, the value of γ is less than 5,000.

公开(公告)号：US20150331314A1

公开(公告)日：2015-11-19

申请号：US14811926

申请日：2015-07-29

Applicant: FUJIFILM CORPORATION

Inventor： Shuhei YAMAGUCHI ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO ,  Hajime FURUTANI ,  Michihiro SHIRAKAWA ,  Mitsuhiro FUJITA

IPC: G03F7/004 ,  C07D409/02 ,  G03F7/32 ,  C07C311/48 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0045 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/16 ,  C07D409/02 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.

Abstract translation: 提供了一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（A）具有能够通过酸的作用分解以产生极性基团的基团的树脂，（C1）含有能够产生的基团的化合物 通过光化射线或辐射照射后的第一酸性官能团和能够产生与光化射线或辐射照射时不同于第一酸性官能团的第二酸性官能团的基团，和（C2）至少一种含有两个 或更多选自由能够产生由光化射线或辐射照射的特定化学式表示的结构的基团组成的组。

公开(公告)号：US20240329531A1

公开(公告)日：2024-10-03

申请号：US18621906

申请日：2024-03-29

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Hideaki Tsubaki ,  Asahi Takaki

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/28 ,  C08F220/38 ,  C08L25/18 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/282 ,  C08F220/283 ,  C08F220/38 ,  C08L25/18 ,  G03F7/0045 ,  G03F7/038

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition having a concentration of solid contents of 15% or more, the resin composition containing (A) a resin including a repeating unit (a1) having an acid-decomposable group and a repeating unit (a2) having an aromatic ring, (B) a resin including a repeating unit (b1) represented by a specified general formula (1), and (C) a compound that generates an acid upon irradiation with an actinic ray or a radiation, wherein a content of a repeating unit having an acid-decomposable group and included in the resin (B) is 5 mol % or less relative to all repeating units in the resin (B).

公开(公告)号：US20190137875A1

公开(公告)日：2019-05-09

申请号：US16234022

申请日：2018-12-27

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Toshiaki FUKUHARA ,  Takamitsu TOMIGA ,  Fumihiro YOSHINO

IPC: G03F7/039 ,  H01L21/027

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a resin which has a repeating unit having an alkyleneoxy chain and a repeating unit having an aromatic group, and has a concentration of the solid content of 10% by mass or more. A pattern forming method has (i) forming an actinic ray-sensitive or radiation-sensitive film having a film thickness of 1 μm or more on a substrate with an actinic ray-sensitive or radiation-sensitive resin composition containing a resin which has a repeating unit having an alkyleneoxy chain.

公开(公告)号：US20230213861A1

公开(公告)日：2023-07-06

申请号：US18175870

申请日：2023-02-28

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Takumi TANAKA ,  Fumihiro YOSHINO ,  Yuma KURUMISAWA

IPC: G03F7/039 ,  G03F7/038

CPC classification number: G03F7/039 ,  G03F7/038

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition having a viscosity of 10 mPa·s or more, the method containing a step 1 of charging at least a resin of which polarity increases by an action of an acid, a photoacid generator, and a solvent as raw materials into a stirring tank, and a step 2 of stirring the raw materials in the stirring tank. A liquid temperature in the stirring tank is controlled to be equal to or lower than a 3.0° C. higher temperature than a liquid temperature at a start of the step 2 throughout the entire step 2, and the control of the liquid temperature in the stirring tank in the step 2 is performed by passing an inert gas through the stirring tank.

公开(公告)号：US20230099422A1

公开(公告)日：2023-03-30

申请号：US17902202

申请日：2022-09-02

Applicant: FUJIFILM Corporation

Inventor： Takumi TANAKA ,  Takashi BANNAI ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO ,  Yuma KURUMISAWA

IPC: G03F7/00 ,  G03F7/028

Abstract: A method for producing a composition, the method being for producing a composition using a stirring device provided with a stirring tank and a stirrer, includes a mixing step of charging a resin, an acid generator, and a solvent into the stirring tank, and a stirring step of stirring the mixture accommodated in the stirring tank, using the stirrer, in which a ratio c of a content of the acid generator to a total mass of the mixture is 0.3% to 2.5% by mass, the stirrer is provided with a rotatable stirring shaft, a plurality of support parts attached to the stirring shaft, and a plurality of stirring elements attached to each of end parts of the plurality of support parts, the shape and the arrangement of the stirring elements are specified, and the positions of the plurality of stirring elements are specified so as to satisfy a specific Expression (1).

公开(公告)号：US20220137512A1

公开(公告)日：2022-05-05

申请号：US17578473

申请日：2022-01-19

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Takamitsu TOMIGA ,  Kohei HIGASHI ,  Fumihiro YOSHINO

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/004 ,  G03F7/38 ,  G03F7/40

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, (B) a photoacid generator, and an anion (P) which is one or more anions selected from the group consisting of NO3−, SO42−, Cl−, and Br−, in which a content of the anion (P) is from 0.01 ppb to 100 ppm with respect to a total mass of the actinic ray-sensitive or radiation-sensitive resin composition, an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.