Invention Application
US20150380648A1 SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS
审中-公开
有机材料蒸汽喷射沉积过程中的流动调节系统及方法
- Patent Title: SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS
- Patent Title (中): 有机材料蒸汽喷射沉积过程中的流动调节系统及方法
-
Application No.: US14730768Application Date: 2015-06-04
-
Publication No.: US20150380648A1Publication Date: 2015-12-31
- Inventor: Gregory McGRAW , William E. QUINN , Matthew KING , Elliot H. HARTFORD, JR. , Siddharth Harikrishna MOHAN , Benjamin SWEDLOVE , Gregg KOTTAS
- Applicant: Universal Display Corporation
- Main IPC: H01L51/00
- IPC: H01L51/00 ; H01L51/56 ; C23C14/12 ; C23C14/24 ; C23C14/54

Abstract:
Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
Public/Granted literature
- US11220737B2 Systems and methods of modulating flow during vapor jet deposition of organic materials Public/Granted day:2022-01-11
Information query
IPC分类: