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公开(公告)号：US20150179987A1
公开(公告)日：2015-06-25
申请号：US14641095
申请日：2015-03-06
Applicant: Universal Display Corporation
Inventor： Ruiqing MA , Zhaoqun ZHOU , Gregory McGRAW , Chun LIN
CPC classification number: H01L51/56 , H01L51/003 , H01L51/0097 , H01L51/52 , H01L51/524 , H01L51/5253 , H01L51/5275 , H01L2251/5338 , Y02E10/549
Abstract: A method of fabricating a substrate for an organic light emitting device (OLED), by applying a volume-reducing substrate material onto a mold with topographical features that generates a smooth but non-flat surface on both sides of the substrate which can enhance light extraction of OLEDs that are built on top of the substrate. The resulting substrate includes surface features on a first substrate surface complementary to the surface features of a mold, such as spherical lens features, and surface features on a second substrate surface, such as dimple features, complementary to the curvature of the spherical lens features on the first substrate surface.
Abstract translation: 一种制造用于有机发光器件（OLED）的衬底的方法，通过将体积减小的衬底材料施加到具有在衬底的两侧上产生平滑但非平坦表面的形貌特征的模具上，所述表面特征可以增强光提取 的OLED被构建在衬底上。 所得到的衬底包括在与模具的表面特征互补的第一衬底表面上的表面特征，例如球形透镜特征，以及第二衬底表面上的表面特征，例如与球面透镜特征的曲率互补的凹坑特征 第一衬底表面。
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公开(公告)号：US20210054495A1
公开(公告)日：2021-02-25
申请号：US17082169
申请日：2020-10-28
Applicant: Universal Display Corporation
Inventor： Gregory McGRAW , William E. QUINN , Matthew KING , Elliot H. HARTFORD, JR. , Siddharth HARIKRISHNA MOHAN , Benjamin SWEDLOVE , Gregg KOTTAS
Abstract: Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
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公开(公告)号：US20180331327A9
公开(公告)日：2018-11-15
申请号：US15441331
申请日：2017-02-24
Applicant: Universal Display Corporation
Inventor： William E. QUINN , Gregory McGRAW , Siddharth HARIKRISHNA MOHAN , Matthew KING , Elliot H. HARTFORD, Jr.
CPC classification number: H01L51/56 , B05B12/18 , B05B15/555 , B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1631 , B41J2/1642 , B41J2002/14475 , C23C14/12 , C23C14/22 , C23C14/228 , C23C14/24 , H01L51/0004 , H01L51/0005 , H01L51/50
Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.
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Patent Agency Ranking
公开(公告)号：US20170162835A1
公开(公告)日：2017-06-08
申请号：US15441331
申请日：2017-02-24
Applicant: Universal Display Corporation
Inventor： William E. QUINN , Gregory McGRAW , Siddharth HARIKRISHNA MOHAN , Matthew KING , Elliot H. HARTFORD, Jr.
CPC classification number: H01L51/56 , B05B12/18 , B05B15/555 , B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1631 , B41J2/1642 , B41J2002/14475 , C23C14/12 , C23C14/22 , C23C14/228 , C23C14/24 , H01L51/0004 , H01L51/0005 , H01L51/50
Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.
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5.发明申请SYSTEMS AND METHODS OF MODULATING FLOW DURING VAPOR JET DEPOSITION OF ORGANIC MATERIALS 审中-公开有机材料蒸汽喷射沉积过程中的流动调节系统及方法公开(公告)号：US20150380648A1
公开(公告)日：2015-12-31
申请号：US14730768
申请日：2015-06-04
Applicant: Universal Display Corporation
Inventor： Gregory McGRAW , William E. QUINN , Matthew KING , Elliot H. HARTFORD, JR. , Siddharth Harikrishna MOHAN , Benjamin SWEDLOVE , Gregg KOTTAS
CPC classification number: C23C14/12 , B05D1/60 , B41J2/045 , B41J2202/02 , C23C14/04 , C23C14/228 , C23C14/54 , H01L51/0005 , H01L51/56
Abstract: Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
Abstract translation: 所公开的主题的实施例提供了方法和系统，包括喷嘴，要沉积在与喷嘴流体连通的基板上的材料源，与待喷射的材料沉积的材料源流体连通的输送气体源， 与喷嘴相邻设置的排气通道，与喷嘴和排气通道流体连通并且邻近排气通道设置的限制气体源，以及致动器，用于调节喷嘴的沉积喷嘴孔和 沉积目标。 飞高高度分离的调整可能会停止和/或开始从喷嘴沉积材料。
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公开(公告)号：US20230357918A1
公开(公告)日：2023-11-09
申请号：US18311519
申请日：2023-05-03
Applicant: Universal Display Corporation
Inventor： Jeff HAWTHORNE , William E. QUINN , Kent Khuong NGUYEN , Sriram KRISHNASWAMI , Gregory McGRAW , Daniel TOET
CPC classification number: C23C14/228 , C23C14/12 , C23C14/50 , C23C14/54
Abstract: Methods, systems, and devices are provided for organic vapor jet deposition (OVJP), which require significantly fewer print heads than conventional OVJP deposition systems. The disclosed OVJP systems include half the number of OVJP print heads than a conventional system, or less, and provide for relative movement of the substrate and print heads to allow for rapid and comprehensive material deposition over the full surface of the substrate.
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7.发明公开公开(公告)号：US20230183852A1
公开(公告)日：2023-06-15
申请号：US18081766
申请日：2022-12-15
Applicant: Universal Display Corporation
Inventor： Gregory McGRAW , William E. QUINN , Matthew KING , Elliot H. HARTFORD, JR. , Siddharth HARIKRISHNA MOHAN , Benjamin SWEDLOVE , Gregg KOTTAS
CPC classification number: C23C14/12 , B41J2/045 , C23C14/04 , C23C14/54 , C23C14/228 , B05D1/60 , B41J2202/02
Abstract: Embodiments of the disclosed subject matter provide methods and systems including a nozzle, a source of material to be deposited on a substrate in fluid communication with the nozzle, a delivery gas source in fluid communication with the source of material to be deposited with the nozzle, an exhaust channel disposed adjacent to the nozzle, a confinement gas source in fluid communication with the nozzle and the exhaust channel, and disposed adjacent to the exhaust channel, and an actuator to adjust a fly height separation between a deposition nozzle aperture of the nozzle and a deposition target. The adjustment of the fly height separation may stop and/or start the deposition of the material from the nozzle.
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8.发明申请MICRO-NOZZLE AND MICRO-NOZZLE ARRAY FOR OVJP AND METHOD OF MANUFACTURING THE SAME 有权用于OVJP的微喷嘴和微喷嘴阵列及其制造方法公开(公告)号：US20160083845A1
公开(公告)日：2016-03-24
申请号：US14858840
申请日：2015-09-18
Applicant: Universal Display Corporation
Inventor： William E. QUINN , Gregory McGRAW , Siddharth HARIKRISHNA MOHAN , Matthew KING , Elliot H. HARTFORD, JR.
CPC classification number: H01L51/56 , B05B15/555 , B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1631 , B41J2/1642 , B41J2002/14475 , C23C14/12 , C23C14/22 , C23C14/228 , C23C14/24 , H01L51/0004 , H01L51/0005 , H01L51/50
Abstract: Embodiments of the disclosed subject matter provide a nozzle assembly and method of making the same, the nozzle assembly including a first aperture formed on a first aperture plate to eject a carrier gas flow having organic vapor onto a substrate in a deposition chamber, second apertures formed on a second aperture plate disposed adjacent to the first aperture to form a vacuum aperture, where the first aperture plate and the second aperture plate are separated by a first separator plate, third apertures formed on a third aperture plate to eject purge gas that are disposed adjacent to the second aperture plate, where the second aperture plate and the third aperture plate are separated by second separator plate, and a third separator plate is disposed adjacent to the one or more third aperture plates to form a gas channel in the one or more third aperture plates.
Abstract translation: 所公开的主题的实施例提供了一种喷嘴组件及其制造方法，喷嘴组件包括形成在第一孔板上的第一孔，以将具有有机蒸汽的载气流喷射到沉积室中的基底上，形成第二孔 在与所述第一孔相邻设置的第二孔板上形成真空孔，其中所述第一孔板和所述第二孔板由第一隔板隔开，所述第三孔形成在第三孔板上以排出所设置的吹扫气体 邻近所述第二孔板，其中所述第二孔板和所述第三孔板由第二隔板隔开，并且第三隔离板邻近所述一个或多个第三孔板设置，以在所述一个或多个孔板中形成气体通道 第三孔板。
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