发明申请
US20160348272A1 METHOD FOR MANUFACTURING GROUP 13 NITRIDE CRYSTAL AND GROUP 13 NITRIDE CRYSTAL
审中-公开
13号硝酸盐晶体和13号硝酸盐晶体的制备方法
- 专利标题: METHOD FOR MANUFACTURING GROUP 13 NITRIDE CRYSTAL AND GROUP 13 NITRIDE CRYSTAL
- 专利标题(中): 13号硝酸盐晶体和13号硝酸盐晶体的制备方法
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申请号: US15115154申请日: 2015-02-19
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公开(公告)号: US20160348272A1公开(公告)日: 2016-12-01
- 发明人: Masahiro HAYASHI , Takashi SATOH , Naoya MIYOSHI , Junichi Wada , Seiji SARAYAMA
- 申请人: Masahiro HAYASHI , Takashi SATOH , Naoya MIYOSHI , Junichi Wada , Seiji SARAYAMA
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd
- 当前专利权人: Ricoh Company, Ltd
- 当前专利权人地址: JP Tokyo
- 优先权: JP2014-054540 20140318; JP2014-221791 20141030
- 国际申请: PCT/JP2015/055494 WO 20150219
- 主分类号: C30B19/06
- IPC分类号: C30B19/06 ; C30B29/68 ; C30B9/12 ; C30B29/40 ; C30B19/02 ; C30B19/12
摘要:
In a method for manufacturing a group 13 nitride crystal, a seed crystal made of a group 13 nitride crystal is arranged in a mixed melt containing an alkali metal and a group 13 element, and nitrogen is supplied to the mixed melt to grow the group 13 nitride crystal on a principal plane of the seed crystal. The seed crystal is manufactured by vapor phase epitaxy. At least a part of contact members coming into contact with the mixed melt in a reaction vessel accommodating the mixed melt is made of Al2O3. An interface layer having a photoluminescence emission peak whose wavelength is longer than the wavelength of a photoluminescence emission peak of the grown group 13 nitride crystal is formed between the seed crystal and the grown group nitride crystal.
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