Invention Application
US20170044004A1 MICRO-ELECTRO-MECHANICAL SYSTEM AND MANUFACTURING METHOD THEREOF
审中-公开
微电子机械系统及其制造方法
- Patent Title: MICRO-ELECTRO-MECHANICAL SYSTEM AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 微电子机械系统及其制造方法
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Application No.: US14826249Application Date: 2015-08-14
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Publication No.: US20170044004A1Publication Date: 2017-02-16
- Inventor: CHUN-WEN CHENG , JUNG-HUEI PENG , CHIA-HUA CHU , NIEN-TSUNG TSAI , YAO-TE HUANG , LI-MIN HUNG , YU-CHIA LIU
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Main IPC: B81B7/00
- IPC: B81B7/00 ; B81C1/00

Abstract:
Some embodiments of the present disclosure provide a microelectromechanical systems (MEMS). The MEMS includes a semiconductive block. The semiconductive block includes a protruding structure. The protruding structure includes a bottom surface. The semiconductive block includes a sensing structure. A semiconductive substrate includes a conductive region. The conductive region includes a first surface under the sensing structure. The first surface is substantially coplanar with the bottom surface. A dielectric region includes a second surface not disposed over the first surface.
Public/Granted literature
- US10273148B2 Micro-electro-mechanical system and manufacturing method thereof Public/Granted day:2019-04-30
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