Invention Application
- Patent Title: PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION
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Application No.: US15131135Application Date: 2016-04-18
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Publication No.: US20170248844A1Publication Date: 2017-08-31
- Inventor: Emad Aqad , James W. Thackeray , James F. Cameron
- Applicant: Rohm and Haas Electronic Materials LLC
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C309/17 ; G03F7/20 ; G03F7/32 ; C08F224/00 ; G03F7/039

Abstract:
A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
Public/Granted literature
Information query
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