- Patent Title: Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition
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Application No.: US15131135Application Date: 2016-04-18
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Publication No.: US11613519B2Publication Date: 2023-03-28
- Inventor: Emad Aqad , James W. Thackeray , James F. Cameron
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: C07C309/17
- IPC: C07C309/17 ; C07C309/06 ; C07C309/07 ; C07C309/12 ; C07C309/20 ; C07C309/23 ; C07C309/42 ; G03F7/004 ; C08F224/00 ; G03F7/039 ; C07C303/32
Abstract:
A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.
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