Invention Application
- Patent Title: DUST COLLECTING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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Application No.: US15239243Application Date: 2016-08-17
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Publication No.: US20170250069A1Publication Date: 2017-08-31
- Inventor: Tomohiko SUGITA , Hiroyasu llMORI , Yoshihiro OGAWA
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Priority: JP2016-034316 20160225
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/687 ; B08B3/12 ; H01L21/67 ; B01D43/00 ; B01D49/00
Abstract:
In one embodiment, a dust collecting apparatus includes a container configured to contain a fluid that includes particles to be collected. The apparatus further includes one or more sound sources configured to generate, in the container, a standing sound wave including at least one node to trap the particles in a vicinity of the node. The one or more sound sources are configured to generate the standing sound wave so that the node does not contact a wall face of the container or contacts a predetermined portion of the wall face of the container. The predetermined portion is formed of a member that prevents the particles from leaving from the node located in a vicinity of the predetermined portion.
Public/Granted literature
- US10290490B2 Dust collecting apparatus, substrate processing system, and method of manufacturing semiconductor device Public/Granted day:2019-05-14
Information query
IPC分类:
