Invention Application
- Patent Title: SPOT ARRAY SUBSTRATE, METHOD FOR PRODUCING SAME, AND NUCLEIC ACID POLYMER ANALYSIS METHOD AND DEVICE
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Application No.: US15529122Application Date: 2015-10-07
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Publication No.: US20170260573A1Publication Date: 2017-09-14
- Inventor: Naoshi ITABASHI , Sonoko MIGITAKA , Masatoshi NARAHARA , Tomohiro SHOJI , Yukio ONO
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Priority: JP2014-240434 20141127
- International Application: PCT/JP2015/078479 WO 20151007
- Main IPC: C12Q1/68
- IPC: C12Q1/68

Abstract:
In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.
Public/Granted literature
- US11130985B2 Spot array substrate, method for producing same, and nucleic acid polymer analysis method and device Public/Granted day:2021-09-28
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