公开(公告)号：US20170260573A1

公开(公告)日：2017-09-14

申请号：US15529122

申请日：2015-10-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Naoshi ITABASHI ,  Sonoko MIGITAKA ,  Masatoshi NARAHARA ,  Tomohiro SHOJI ,  Yukio ONO

IPC: C12Q1/68

CPC classification number: C12Q1/6809 ,  B01J19/0046 ,  B01J2219/00421 ,  B01J2219/00466 ,  B01J2219/00621 ,  B01J2219/00648 ,  B01J2219/00659 ,  B01J2219/00722 ,  B32B27/32 ,  C08G77/50 ,  C12Q1/6806 ,  C12Q1/6874 ,  G01N2035/00237 ,  G01N2035/1034

Abstract: In order to reduce the cost of producing a spot array substrate and reduce the cost of nucleic acid polymer analysis, a spot array substrate is used which is produced by preparing a resin substrate 402 having a surface on which an uneven pattern is formed and a plurality of bead sitting positions set in a two-dimensional array within the uneven pattern, and loading surface-modified beads onto the bead sitting positions of the resin substrate.